Nanometer-level alignment using interferometric-spatial-phase-imaging (ISPI) during silicon nanowire growth

Srisungsitthisunti, Pornsak; Moon, Euclid E.; Tansarawiput, Chookiat; Zhang, Huaichen; Qi, Minghao; Xu, Xianfan

doi:10.1117/12.860581

Cited by 4 publications

(6 citation statements)

References 7 publications

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“…This method was also employed in our previous works for near-field nanolithography 26−28 and near-field nanomaterials growth. 29 To explain briefly, the ISPI method uses interferometric marks consisting of reversely chirped grating pairs (Figure 1c). Illuminated by a laser beam, the grating pairs diffract and reflect the laser beam, forming counter propagating interference patterns that are sensitive to the gap.…”

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confidence: 99%

Near-Field Thermal Radiation between Two Plates with Sub-10 nm Vacuum Separation

et al. 2020

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Radiation greatly exceeding blackbody between two objects separated by microscale distances has attracted great interest. However, challenges in reaching such a small separation between two plates have so far prevented studies below a separation distance of about 25 nm. Here, we report a study of radiation enhancement in the near-field regime of less than 10 nm between two parallel plates. We make use of bulk, rigid plates to approach small separation distances without the adverse snap-in effect, develop embedded temperature sensors to allow near-zero separation, and employ advanced sensing method to level the plates and approach and maintain small separations. Our findings agree with theoretical predictions between parallel surfaces with separations down to 7 nm where an 18000 times enhancement in radiation between two quartz plates is observed. Our method can also be used to explore heat transfer between other materials and can possibly be extended to smaller separation gaps.

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confidence: 99%

Near-Field Thermal Radiation between Two Plates with Sub-10 nm Vacuum Separation

et al. 2020

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“…In theory, the ISPI gratings can be designed for an arbitrarily gap range. 13 For example, it has been used for gaps of tens of micrometers for parallel zone plate array lithography 12,14 and materials growth. 15 In this work, we demonstrate using ISPI to control a gap less than 20 nm for near-field optical nanolithography with sensitivity in the subnanometer lever.…”

Section: Introductionmentioning

confidence: 99%

“…The ISPI gapping is based on the detection of interference fringes from a set of specially designed gratings on an optical mask. [9][10][11][12] By analyzing interference signals, the frequency and phase information of the interference fringes can be obtained and used to derive the value of the gap between the mask and the substrate. The ISPI system employs oblique light incident geometry so that it can be integrated with the lithography system without interfering with the lithography process.…”

Section: Introductionmentioning

confidence: 99%

High precision dynamic alignment and gap control for optical near-field nanolithography

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Srisungsitthisunti

et al. 2013

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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The authors demonstrate the use of interferometric-spatial-phase-imaging (ISPI) to control a gap distance of the order of nanometers for parallel optical near-field nanolithography. In optical near-field nanolithography, the distance between the optical mask and the substrate needs to be controlled within tens of nanometers or less. The ISPI technique creates interference fringes from checkerboard gratings fabricated on the optical mask, which are used to determine the gap distance between the mask and the substrate surfaces. The sensitive of this gapping technique can reach 0.15 nm. With the use of ISPI and a dynamic feedback control system, the authors can precisely align the mask and the substrate and keep variation of the gap distance below 6 nm to realize parallel nanolithography.

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“…The gap detection is based on analysis of phase and frequency information of the interference fringes produced by the ISPI gratings [15][16][17]. As Figs.…”

Section: Interferometric-spatial-phase-imaging (Ispi)mentioning

confidence: 99%

Optical nanolithography with λ/15 resolution using bowtie aperture array

et al. 2014

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We report optical parallel nanolithography using bowtie apertures with the help of the interferometricspatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications.

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Nanometer-level alignment using interferometric-spatial-phase-imaging (ISPI) during silicon nanowire growth

Cited by 4 publications

References 7 publications

Near-Field Thermal Radiation between Two Plates with Sub-10 nm Vacuum Separation

Near-Field Thermal Radiation between Two Plates with Sub-10 nm Vacuum Separation

High precision dynamic alignment and gap control for optical near-field nanolithography

Optical nanolithography with λ/15 resolution using bowtie aperture array

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