Nanometer‐designed Al/SiC periodic multilayers: characterization by a multi‐technique approach

Galtayries, Anouk; Hu, Min; Guen, Karine Le; André, Jean‐Michel; Jonnard, Philippe; Meltchakov, Evgueni; Hecquet, Christophe; Delmotte, Franck

doi:10.1002/sia.3393

Cited by 17 publications

(4 citation statements)

References 21 publications

(7 reference statements)

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“…However, Al/SiC periodic multilayers have a large interfacial roughness that leads to low experimental reflectivity. No significant interdiffusion between the layers could be observed using x-ray emission spectroscopy [7,8]. An addition of a thin Mo layer to only the SiC-on-Al interfaces decreases the interfacial roughness and thus improves the optical performances of this system.…”

Section: Introductionmentioning

confidence: 98%

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light

Hu¹,

Guen²,

André³

et al. 2010

Opt. Express

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We present the results of an optical and chemical, depth and surface study of Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC system, the introduction of Mo as a third material in the multilayer structure allows us to decrease In comparison to the previously studied Al/SiC system with a reflectance of 37% at near normal incidence around 17 nm, the introduction of Mo as a third material in the multilayer structure allows us to decrease the interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with synchrotron radiation. This is the first report of a reflectivity higher than 50% around 17 nm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC system in order to analyze the individual layers within the stack. ToF-SIMS and XPS results give evidence that the first SiC layer is partially oxidized, but the O atoms do not reach the first Mo and Al layers. We use these results to properly describe the multilayer stack and discuss the possible reasons for the difference between the measured and simulated EUV reflectivity values.

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Section: Introductionmentioning

confidence: 98%

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light

Hu¹,

Guen²,

André³

et al. 2010

Opt. Express

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“…However, the shapes are very sensitive to the chemical state of the Si atoms. This behavior has already been exploited to study film/substrate systems [23][24][25] as well as multilayers [26][27][28][29][30][31]. The shape of the CoSi 2 emission presents a shoulder towards the high photon energies, whereas the shape of CoSi is symmetric and that of Co 2 Si asymmetric, its half-width towards the low photon energies being larger than towards the high photon energies.…”

Section: X-ray Emission Spectroscopymentioning

confidence: 97%

Origin of step-like behavior in the Co/Si system

Sagdeo¹,

Rai²,

Srivastava³

et al. 2011

J. Phys.: Condens. Matter

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A systematic investigation of the structure, nature of the interface and their possible connections with magnetic properties for the as-deposited Co/Si/Co trilayer system has been carried out. X-ray reflectivity, cross-sectional transmission electron microscopy and x-ray emission measurements performed on the Co/Si/Co trilayer system show that when the Si layer thickness is less than ∼ 20 Å, the full Si layer is converted into a cobalt silicide layer whereas when the Si layer thickness > 20 Å along with the silicide layer. the pure Si layer also remains. A comparison of magneto-optical Kerr effect and magnetoresistance measurements reveals the absence of antiferromagnetic coupling in these samples. Double-step-like magnetization, in the case of Si layer thickness > 20 Å between two Co layers, is explained by magnetization reversal of two ferromagnetic layers having different coercivities, independent of each other.

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“…It follows from the above that the introduction of an antidiffusion barrier layer may contribute to smoothing of interfaces in certain cases. For example, a thin Mo layer introduced at the SiC-on-Al interface reduced its roughness and thus enhanced the optical properties of this system; Al/Mo/SiC multilayer interfaces became sharper than the Al/SiC system interfaces [36,38,73].…”

Section: Reduction Of Interface Roughnessmentioning

confidence: 99%

Focusing diffraction optics for orbital telescopes

Лидер

2022

Optics and Spectroscopy

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The review is devoted to the principles, state of the art and problems of diffractive optics used to focus X-ray and γ-radiation in telescopes at orbital stations. Various multilayer structures for normal incidence telescopes, supermirrors for Wolter optics, Laue lens as a soft γ-radiation concentrator, as well as modified Fresnel zone plates for focusing radiation in a wide energy range with an unprecedented high angular resolution (10-1-10-3''). Keywords: X-ray and γ-radiation, X-ray and γ-telescopes, diffraction, multilayer structures, Laue lens, Fresnel zone plates.

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Nanometer‐designed Al/SiC periodic multilayers: characterization by a multi‐technique approach

Cited by 17 publications

References 21 publications

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light

Origin of step-like behavior in the Co/Si system

Focusing diffraction optics for orbital telescopes

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