2003
DOI: 10.1021/nl034610j
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Nanolithography Based on Real-Time Electrically Controlled Indentation with an Atomic Force Microscope for Nanocontact Elaboration

Abstract: We report on the fabrication of nanocontacts by indentation of an ultrathin insulating photoresist layer deposited on various types of conductive structures. A modified atomic force microscope (AFM) designed for local resistance measurements is used as a nanoindenter. The nanoindentation is performed while measuring continuously the resistance between the conductive tip of the AFM and the conductive layer, which is used as the trigger parameter to stop the indentation. This allows an extremely accurate control… Show more

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Cited by 58 publications
(51 citation statements)
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“…The Fe layers were grown by RF sputtering at room temperature and covered by a naturally oxidized Al layer, resulting in a AlO x (1.5 nm)/Al(1.5 nm) cap. The tunnel junctions were defined by nanoindentation lithography 46,47 with top electrodes of either Au/CoO/Co or Au/CoO/Co/Fe (see also ref. 26 for details on the role of CoO).…”
Section: Methodsmentioning
confidence: 99%
“…The Fe layers were grown by RF sputtering at room temperature and covered by a naturally oxidized Al layer, resulting in a AlO x (1.5 nm)/Al(1.5 nm) cap. The tunnel junctions were defined by nanoindentation lithography 46,47 with top electrodes of either Au/CoO/Co or Au/CoO/Co/Fe (see also ref. 26 for details on the role of CoO).…”
Section: Methodsmentioning
confidence: 99%
“…There are two main types of SPL. One is a destructive method that physically, chemically, or electronically deforms the substrate's surface to make up the pattern by providing the substrate with energy; [37,[146][147][148] the other is a constructive way in which the patterning is performed by directly transferring chemical species to the surface. [149] Because the sharp tips of a scanning probe microscope with a radius smaller than 10 nm can be neatly and controllably manipulated across the substrate, SPL can be utilized to construct nanogap electrodes.…”
Section: Scanning Probe Lithography and Manipulation Of Single Atomsmentioning
confidence: 99%
“…23 In these experiments, the resistance of the LSMO bottom electrode was always small enough to ensure homogeneous current flow through the junction. The I͑V͒ curve of the right inset in Fig.…”
mentioning
confidence: 99%