Nanoindentation-induced interfacial fracture of ZnO thin films deposited on Si(111) substrates by atomic layer deposition

Lee, Ya-Hui

doi:10.1016/j.jallcom.2013.10.213

Cited by 32 publications

(11 citation statements)

References 33 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…a, b) shows the load-displacement curves determined from the nanoindentation measurements corresponding to the Ti doped ITO samples of both Ti contents and after being annealed. It was reported by Jian and co-worker that establishment of cracking in films underneath the nanoindentor resulted in a distinct discontinuity in the loading part of the loading displacement curve[39]. In this study, the experimental nanoindentation results presented inFigure 9(a, b) confirmed that continuous loading curves were obtained for all the films, indicating that the phenomenon of cracking was absent in the Ti doped ITO films at different Ti contents and annealing temperatures.Figure 10shows typical load-displacement curves of the nanoindentation measurements.…”

supporting

confidence: 78%

Probing the effects of thermal treatment on the electronic structure and mechanical properties of Ti-doped ITO thin films

Taha

Henry

Yin

et al. 2017

Journal of Alloys and Compounds

View full text Add to dashboard Cite

Titanium-doped indium tin oxide thin films were synthesized via a sol-gel spin coating process. Surface chemical bonding states and mechanical properties have been investigated as a function of titanium content (2 and 4 at%) and annealing temperature ranging from 400 to 600 °C with increments of 100 °C. Raman analysis was performed to study the phonon vibrations for the prepared samples and the results revealed the existence of ITO vibrational modes. The elemental compositions, bonding states and binding energies of the film materials were investigated using X-ray photoelectron spectroscopy (XPS) technique. The XPS results indicated that the ratio of the metallic elements (In, Sn, Ti) to the oxygen on the surface of the thin film coatings decreased due to the increase of the oxide layer on the surface of the thin films. Also, by increasing the annealing temperature up to 600 °C, the Ti 2p and Cl 2p signals were no longer detected for both 2 and 4 at% Ti contents, respectively, due to the thicker surface oxidation layer. Mechanical properties of the synthesized films were also evaluated using a nanoindentation process. Variations in the hardness (H) and the elastic modulus (E) were observed with different Ti at% and annealing temperatures. The hardness is within the range of 6.3–6.6 GPa and 6.7–6.8 GPa for 2 and 4 at% Ti content samples, respectively, while the elastic modulus is within the ranges of 137–143 and 139–143 GPa for 2 at% and 4 at% Ti contents samples, respectively. A combination of the highest H and E were achieved in the sample of 4% Ti content annealed at 600 °C. Furthermore, the H/E ratio ranges from 4.5 × 10−2 to 5.0 × 10−2 which reflects a reasonable level of wear resistance

show abstract

supporting

confidence: 78%

Probing the effects of thermal treatment on the electronic structure and mechanical properties of Ti-doped ITO thin films

Taha

Henry

Yin

et al. 2017

Journal of Alloys and Compounds

View full text Add to dashboard Cite

show abstract

“…Mechanical studies on ALD films mostly concentrated on elastic modulus, hardness measurement, or residual stress and can be classified into work on single compound film materials, mainly oxides and nitrides, prepared on stiff substrates, like Si or glass [15,16,17,18,19,20,21,22,23,24,25,26] and Al 2 O 3 [27]. The mechanical properties of nanolaminates films have also been investigated on stiff substrates [19,28,29,30,31,32,33,34].…”

Section: Introductionmentioning

confidence: 99%

Fracture Mechanics and Oxygen Gas Barrier Properties of Al2O3/ZnO Nanolaminates on PET Deposited by Atomic Layer Deposition

et al. 2019

View full text Add to dashboard Cite

Rapid progress in the performance of organic devices has increased the demand for advances in the technology of thin-film permeation barriers and understanding the failure mechanisms of these material systems. Herein, we report the extensive study of mechanical and gas barrier properties of Al2O3/ZnO nanolaminate films prepared on organic substrates by atomic layer deposition (ALD). Nanolaminates of Al2O3/ZnO and single compound films of around 250 nm thickness were deposited on polyethylene terephthalate (PET) foils by ALD at 90 °C using trimethylaluminium (TMA) and diethylzinc (DEZ) as precursors and H2O as the co-reactant. STEM analysis of the nanolaminate structure revealed that steady-state film growth on PET is achieved after about 60 ALD cycles. Uniaxial tensile strain experiments revealed superior fracture and adhesive properties of single ZnO films versus the single Al2O3 film, as well as versus their nanolaminates. The superior mechanical performance of ZnO was linked to the absence of a roughly 500 to 900 nm thick sub-surface growth observed for single Al2O3 films as well as for the nanolaminates starting with an Al2O3 initial layer on PET. In contrast, the gas permeability of the nanolaminate coatings on PET was measured to be 9.4 × 10−3 O2 cm3 m−2 day−1. This is an order of magnitude less than their constituting single oxides, which opens prospects for their applications as gas barrier layers for organic electronics and food and drug packaging industries. Direct interdependency between the gas barrier and the mechanical properties was not established enabling independent tailoring of these properties for mechanically rigid and impermeable thin film coatings.

show abstract

“…In addition, it has been widely recognized that the loading and unloading segments of the nanoindentation load-displacement curves often reflect rich information about the dominant deformation mechanism prevailing in the materials under investigation. For instance, the load-displacement responses provide substantial insights into the onset of plastic deformation, phase transformation, creep resistance or fracture behaviors of the various materials [16][17][18][19][20][21][22][23]. In nanoindentation, it has been ubiquitously identified that the materials often exhibit a characteristic feature called the "pop-in" phenomenon during loading.…”

Section: Introductionmentioning

confidence: 99%

“…It manifests as a sudden displacement burst at a nearly constant indentation load, signifying the onset of plastic deformation. In general, the "pop-in" behavior has been interpreted as the manifestations of the dislocation activity [16][17][18], while in some materials it was attributed to either nanoindentation-induced phase transformation [19,20] or to the crack/delamination phenomena of the interface of films and substrates [23,24].…”

Section: Introductionmentioning

confidence: 99%

Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films

Hwang

Pan

et al. 2020

Micromachines

Self Cite

View full text Add to dashboard Cite

The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 • C to 800 • C. The XRD results indicated that for annealing temperature in the ranged from 300 • C to 500 • C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 • C. Further increasing the annealing temperature to 700 • C and 800 • C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.

show abstract

Nanoindentation-induced interfacial fracture of ZnO thin films deposited on Si(111) substrates by atomic layer deposition

Cited by 32 publications

References 33 publications

Probing the effects of thermal treatment on the electronic structure and mechanical properties of Ti-doped ITO thin films

Probing the effects of thermal treatment on the electronic structure and mechanical properties of Ti-doped ITO thin films

Fracture Mechanics and Oxygen Gas Barrier Properties of Al2O3/ZnO Nanolaminates on PET Deposited by Atomic Layer Deposition

Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films

Contact Info

Product

Resources

About