Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane

Nakamatsu, Ken−ichiro; Matsui, Shinji

doi:10.1143/jjap.45.l546

Cited by 22 publications

(17 citation statements)

References 12 publications

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“…While the abovementioned methods cannot achieve ultrafine features (a few lm's down to ∼ 100 nm) in high aerial density and good reproducibility, nanoimprinting lithography (NIL) allows easy fabrication of precise nanoscale structures. NIL has been applied for nanopatterning in various fields such as biological nanostructures, [21] nanophotonic devices, [22,23] organic electronics, [24,25] and the patterning of magnetic materials. [26] Especially, metal nanopatterning via nanoimprinting is widely employed in nanoscale electronics and biosensing platforms.…”

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Nanoscale Patterning and Electronics on Flexible Substrate by Direct Nanoimprinting of Metallic Nanoparticles

et al. 2008

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Recent years have witnessed an expanding interest in the application of flexible polymer materials (e.g., polyimide, polyester, etc.) as the substrates for electronic and display devices. These applications include flexible organic light-emitting displays, [1,2] thin film transistors, [3][4][5] sensors, [6,7] and polymer MEMS. [8,9] The advantages of polymer-based materials are their mechanical flexibility, light weight, enhanced durability, and low cost compared with rigid materials (such as silicon and quartz). However, it can be difficult to integrate polymers into an integrated circuit (IC) microfabrication process due to their low thermal stability (low melting and low glass transition temperatures) and solvent susceptibility. In practice, conventional IC fabrication processes are subject to limitations, in that they are multi-step, involve high processing temperatures, caustic baths and strong solvents. In order to address the current problems of microfabrication on flexible substrate, many alternative approaches to conventional photolithography-based process have been introduced by a number of researchers. These include microcontact printing (lCP) combined with metal etching, [10] electroless plating, [11] electropolymerization, [12] and direct metal layer transfer [13] for the microscale metal patterning on flexible substrates. Stencil lithography [14] was mainly applied for dielectric layer patterning on polymer substrates for the formation of electrical capacitors [15,16] due to its limited resolution. Inkjet printing was used for a drop-on-demand patterning of conductive polymer PEDOT [17] and gold [18] layers for drain-source and gate electrodes. However, its best resolution is 20-50 lm [19,20] limited by the nozzle diameter, the statistical variation of the droplet flight, and spreading on the substrate. Organic semiconducting materials are being widely used as semiconducting layers in flexible electronics due to their costeffectiveness, mechanical flexibility, and ease of application via specific chemical modification. However, further channel size down-scaling is essential for better performance of organic field effect transistor due to the lower carrier mobility of the organic semiconducting materials. While the abovementioned methods cannot achieve ultrafine features (a few lm's down to ∼ 100 nm) in high aerial density and good reproducibility, nanoimprinting lithography (NIL) allows easy fabrication of precise nanoscale structures. NIL has been applied for nanopatterning in various fields such as biological nanostructures, [21] nanophotonic devices, [22,23] organic electronics, [24,25] and the patterning of magnetic materials. [26] Especially, metal nanopatterning via nanoimprinting is widely employed in nanoscale electronics and biosensing platforms. However, metal nanoimprinting has been typically an indirect process where a polymer (e.g., PMMA) pattern is first created by nanoimprinting, and then used as a mask for metal film etching or metal lift-off process. [27] This involves multiple and ...

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Nanoscale Patterning and Electronics on Flexible Substrate by Direct Nanoimprinting of Metallic Nanoparticles

et al. 2008

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“…However, a long EB exposure time is needed to make the HSQ pattern. Previously, we reported that the HSQ pattern can be obtained by room temperature (RT) nanoimprinting with a short fabrication time [13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32] . In RT-nanoimprinting, the mold is pressed to a sol-gel material such as SOG without heating and UV irradiation processes.…”

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Surface Evaluation of HSQ Containing PDMS Additive after Room-temperature Nanoimprinting

Sugano

Okada

Haruyama

et al. 2015

J. Photopol. Sci. Technol.

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“…[8][9][10] The HSQ is used as an inorganic solgel material consisting of repeated units of H 2 SiO 3/2 . In our previous work, hydrogen silsesquioxane (HSQ) was used as a resin.…”

Section: Introductionmentioning

confidence: 99%

“…[8][9][10] The HSQ is used as an inorganic solgel material consisting of repeated units of H 2 SiO 3/2 . [8][9][10] In the casted method, we applied the resist solution between the mold and the substrate. 12 In addition, HSQ can also be used as an etching mask because HSQ resin contains no organic groups.…”

Section: Introductionmentioning

confidence: 99%

Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solvent

Kang

Okada

Omoto

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Articles you may be interested inReal-time full-area monitoring of the filling process in molds for UV nanoimprint lithography using dark field illumination J. Vac. Sci. Technol. B 30, 06FB13 (2012); 10.1116/1.4767122 High-quality global hydrogen silsequioxane contact planarization for nanoimprint lithography J. Vac. Sci. Technol. B 29, 021602 (2011); 10.1116/1.3562939 45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation J. Vac. Sci. Technol. B 28, C6M12 (2010); 10.1116/1.3507882 UV irradiation effect on sol-gel indium tin oxide nanopatterns replicated by room-temperature nanoimprint

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Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane

Cited by 22 publications

References 12 publications

Nanoscale Patterning and Electronics on Flexible Substrate by Direct Nanoimprinting of Metallic Nanoparticles

Nanoscale Patterning and Electronics on Flexible Substrate by Direct Nanoimprinting of Metallic Nanoparticles

Surface Evaluation of HSQ Containing PDMS Additive after Room-temperature Nanoimprinting

Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solvent

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