Nanoimprint Mold for 2.5 Tbit/in.<sup>2</sup> Directed Self-Assembly Bit Patterned Media with Phase Servo Pattern

Yamamoto, Ryōta; Yuzawa, Akiko; Shimada, Takuya; Ootera, Yasuaki; Kamata, Y.; Kihara, Naoko; Kikitsu, Akira

doi:10.1143/jjap.51.046503

Cited by 10 publications

(9 citation statements)

References 37 publications

(54 reference statements)

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“…Forming arbitrary nonregular patterns, such as servo patterns, is challenging for BCP lithography. When topographic guiding patterns are used, servo patterns can be directly written as trenches by e-beam and then filled with BCP. , When chemical guiding patterns are used, the BCP must be coerced into forming servo patterns. If particularly complex servo patterns are required, BCPs cannot form the necessary patterns, and servo patterns have to be integrated by applying an additional lithographic step without DSA.…”

Section: Resultsmentioning

confidence: 99%

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

et al. 2015

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We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials having a full pitch from 27 to 18.5 nm. While directed self-assembly on chemical contrast patterns was successful with all the materials used in this study, clean removal of PMMA domains and subsequent pattern transfer could only be sustained down to 22 nm full pitch. We attribute this limitation to the width of the interface, which may represent more than half of the domain width for materials with a critical dimension below 10 nm. With the limit of pattern transfer for PS-b-PMMA set at ∼11 nm, we propose an integration scheme suitable for bit patterned media for densities above 1.6 Tdot/in(2), which require features below this limit. Directed self-assembly was carried out on chemical contrast patterns made by a rotary e-beam lithography system, and pattern transfer was carried out to demonstrate fabrication of large area (up to 25 mm-wide annular band of circular tracks) nanoimprint templates for bit patterned media. We also demonstrate compatibility with hard disk drive architecture by fabricating patterns with skewed radial lines with constant angular pitch and with servo patterns that are needed in hard disk drives to generate a radial positional error signal (PES).

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Section: Resultsmentioning

confidence: 99%

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

et al. 2015

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“…Focusing on BPM applications, the directed self-assembly of cylinder-forming PS-b-PMMA implemented on a chemically pre-patterned substrate has been used to fabricate over an arbitrarily large area of vertical and cylindrical pore nanostructures with a density of 1 Tb/in 2 (Yang et al, 2009). In addition, the use of sphere-forming PS-b-PDMS (Yamamoto et al, 2012;Xiao et al, 2014) and cylinder-forming PS-b-PMMA (Yang et al, 2014) has also been reported to manufacture integrated templates with both data and servo fields. In these cases, the pre-pattern guides of the BCP self-assembly were prepared by NIL.…”

Section: Bit Patterned Mediamentioning

confidence: 99%

Fabrication of Nanodevices Through Block Copolymer Self-Assembly

Xiong

2022

Front. Nanotechnol.

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Block copolymer (BCP) self-assembly, as a novel bottom-up patterning technique, has received increasing attention in the manufacture of nanodevices because of its significant advantages of high resolution, high throughput, low cost, and simple processing. BCP self-assembly provides a very powerful approach to constructing diverse nanoscale templates and patterns that meet large-scale manufacturing practices. For the past 20 years, the self-assembly of BCPs has been extensively employed to produce a range of nanodevices, such as nonvolatile memory, bit-patterned media (BPM), fin field-effect transistors (FinFETs), photonic nanodevices, solar cells, biological and chemical sensors, and ultrafiltration membranes, providing a variety of configurations for high-density integration and cost-efficient manufacturing. In this review, we summarize the recent progress in the fabrication of nanodevices using the templates of BCP self-assembly, and present current challenges and future opportunities.

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“…Another group of researchers from Toshiba demonstrated a BPM disk with a ridge-andgroove servo pattern by directly using sphere-forming PS-b-PDMS BCP as an etching mask. [21][22][23] A drawback of using the groove guided DSA process in both the data and the servo regions at the same time is the real-estate loss and the challenge in dot-position control guided by graphoepitaxy in the data area. Using DSA with a two-dimensional (2-D) dot-array prepattern in the data area overcomes this problem.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Yang

Xiao

Hsu

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Directed self-assembly (DSA) of block copolymers (BCPs) proves to be a viable solution for the ultrahigh density bit-patterned media (BPM) application. However, servo design integration is still extremely challenging since the servo layouts require more complex patterns than the simple arrays naturally achieved by the DSA process. We present an integration scheme to create BPM servo patterns by utilizing the BCP dot-array patterns. This proposed method is based on an imprint guided two-step DSA process, combined with conventional optical lithography to define two separate zones. Both the data zone and servo zone consist of selfassembled hexagonal dot arrays: a regular pattern in the data zone and an arbitrary pattern in the servo zone. This method was successfully used to fabricate a servo-integrated BPM template with an areal density of 1.5 Teradot∕inch 2 (Td∕in: 2 ) (L o ¼ 22.3 nm). Using the fabricated quartz template, CoCrPt BPM media has been successfully patterned by nanoimprint lithography and subsequent ion-beam etching process on a 2.5 in. disk. Further, using patterned-in servo wedges on 1.5 Td∕in:2 patterned CoCrPt media, we are able to close the servo control loop for track-following on a spin-stand test. The standard deviation of repeatable run-out over the full revolution is calculated to be about 4% of the 38.6 nm track pitch. This method is currently being used to fabricate a template at a much higher density of 3.2 Td∕in: 2 (L o ¼ 15.2 nm). © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Nanoimprint Mold for 2.5 Tbit/in.² Directed Self-Assembly Bit Patterned Media with Phase Servo Pattern

Cited by 10 publications

References 37 publications

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

Fabrication of Nanodevices Through Block Copolymer Self-Assembly

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

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Nanoimprint Mold for 2.5 Tbit/in.2 Directed Self-Assembly Bit Patterned Media with Phase Servo Pattern

Cited by 10 publications

References 37 publications

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

Fabrication of Nanodevices Through Block Copolymer Self-Assembly

Fabrication of servo-integrated template for 1.5 Teradot/inch2bit patterned media with block copolymer directed assembly

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Product

Resources

About

Nanoimprint Mold for 2.5 Tbit/in.² Directed Self-Assembly Bit Patterned Media with Phase Servo Pattern

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly