2011
DOI: 10.1016/j.jcrysgro.2010.11.165
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Nanoimprint lithography patterned GaAs templates for site-controlled InAs quantum dots

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Cited by 37 publications
(25 citation statements)
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References 21 publications
(20 reference statements)
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“…Further approaches for an optimized QD growth are based on the controlled nucleation of semiconductor material at predefined positions—referred as site‐controlled QD (SCQD) growth. Here, the sample surface is usually pre‐patterned, for example, via lithography and a following etching step or nanoimprint lithography to form circular or pyramidal pits that serve as a nucleation spot for the QD material. Compared to the random growth of self‐assembled QDs, this technique offers the controlled positioning and formation on the sample surface with a predefined QD density.…”
Section: Quantum Dots As Nonclassical Light Sourcesmentioning
confidence: 99%
“…Further approaches for an optimized QD growth are based on the controlled nucleation of semiconductor material at predefined positions—referred as site‐controlled QD (SCQD) growth. Here, the sample surface is usually pre‐patterned, for example, via lithography and a following etching step or nanoimprint lithography to form circular or pyramidal pits that serve as a nucleation spot for the QD material. Compared to the random growth of self‐assembled QDs, this technique offers the controlled positioning and formation on the sample surface with a predefined QD density.…”
Section: Quantum Dots As Nonclassical Light Sourcesmentioning
confidence: 99%
“…Another problem associated with S-K and droplet epitaxy arises from the random nucleation positions of the QDs, which limits the feasibility of integration with other photonic elements. This obstacle has been tackled by modifying the growth surface chemical potential, either by using a dielectric mask with apertures [12], [13], by ex-or in-situ etching of nano-cavities [14], [15], or by inducing local strain [16] thereby defining a preferential nucleation point. For example, a small inhomogeneous broadening (14.4 meV) and narrow lines (> 43 μeV) of QDs were achieved by employing SK growth of InGaAs/GaAs QDs in circular nano-recesses on (100) GaAs substrates [17], and more recently linewidths as low as 6 µeV were obtained by SK growth of InAs QDs on a thick GaAs buffer layer grown on a patterned substrate [18].…”
Section: Introductionmentioning
confidence: 99%
“…To this end, UV-nanoimprint lithography (UV-NIL) is a high resolution, large scale patterning technique, which has been shown to be suitable for the fabrication of SCQDs. 10 For example, the fabrication of large arrays of SCQDs with tunable properties and high optical quality using a combination of UV-NIL and molecular beam epitaxy (MBE) has been reported. [11][12][13][14][15] However, for practical applications, it is important to obtain high collection efficiency of the emission from/to the QD.…”
mentioning
confidence: 99%
“…The patterning and chemical cleaning processes are described in more detail elsewhere. 10 A 30 nm GaAs buffer layer and 1.8 ML of InAs were deposited at 470 C and 540 C, respectively, on top of the pattern followed by the upper half of the cavity. After the growth of the top DBR, focused ion beam induced deposition of Platinum was utilized to form an etch mask for fabricating the micropillars.…”
mentioning
confidence: 99%