Polymer Science: A Comprehensive Reference 2012
DOI: 10.1016/b978-0-444-53349-4.00194-1
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Nanoimprint Lithography of Polymers

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Cited by 8 publications
(7 citation statements)
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“…Pillar arrays were created via replica molding, which is a two-step imprinting procedure derived from NIL; see Figures and S1 . The first step creates a replica mold of the master mold, where the pillar arrays are transferred to the replica mold as nanoholes.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Pillar arrays were created via replica molding, which is a two-step imprinting procedure derived from NIL; see Figures and S1 . The first step creates a replica mold of the master mold, where the pillar arrays are transferred to the replica mold as nanoholes.…”
Section: Methodsmentioning
confidence: 99%
“…Pillar arrays were created via replica molding, which is a two-step imprinting procedure derived from NIL; see Figures 1 and S1. 29 The first step creates a replica mold of the master mold, where the pillar arrays are transferred to the replica mold as nanoholes. The master molds are electron-etched silicon wafers decorated with pillar arrays (1 × 1 cm 2 ) obtained from Nano Imprint Lithography Technology (Kongens Lyngby, Denmark) and prepared for the NIL procedure by assembling a HFDTS monolayer on their surface.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…This patterning can be achieved with enhanced throughput when compared to other advanced patterning techniques such as photolithography and e-beam lithography, etc. [22][23][24][25][26] Recently, we demonstrated large-area continuous roll-to-roll nanoimprinting of 1D and 2D micrometer to sub-100 nm features on fl exible substrate using perfl uoropolyether (PFPE) hybrid molds on a custom designed roll-toroll nanoimprinter. [ 27 ] R2RNIL is a platform process technology that can be adapted to a wide range of applications including fl at panel displays, [ 28,29 ] biomedical devices, [ 30 ] fl exible solar cells and antirefl ective coatings for solar cells.…”
Section: Introductionmentioning
confidence: 99%
“…21 The laterally controlled fabrication of DFB gratings for organic semiconductor lasers has only been addressed so far by using nanograting transfer to transfer the gratings onto a homogeneous gain material layer, 22 and a rather complex approach using direct electron beam lithography (EBL) on conjugated polymers. 23 On the other hand, various substrate scale techniques such as laser interference lithography (LIL) 24 and nanoimprint lithography (NIL) 25 are available to achieve the low-cost fabrication of high-quality DFB corrugation nanostructures on an LOC platform. Among them, NIL promises the mass-production of extremely ne structures with feature sizes down to 10 nm.…”
Section: Introductionmentioning
confidence: 99%
“…26 The resolution of NIL can be further improved by the fabrication of a rigid mold with sub-10 nm features. 25 Nowadays, two main subjects of NIL are frequently used in the fabrication of DFB corrugations for organic semiconductor laser applications: thermal nanoimprint lithography (TNIL, also known as hot embossing) and UV-assisted nanoimprint lithography (UV-NIL). [27][28][29][30] UV-NIL is an option to fabricate localized DFB corrugations without negative effects on the existing structures, but it is mandatory to use special photoactive materials in the process.…”
Section: Introductionmentioning
confidence: 99%