Nanoimprint Lithography - Next Generation Nanopatterning Methods for Nanophotonics Fabrication

Viheriälä, Jukka; Niemi, Tapio; Kontio, Juha; Pessa, M.

doi:10.5772/6917

Cited by 12 publications

(15 citation statements)

References 36 publications

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“…Since the soft UV-NIL was introduced, various structural types or configurations have been developed and employed. The most common type of the soft mold is a bi-layer structure which is composed of a rigid glass backplane for mechanical stability (optional) and a patterned soft PDMS (the commercially available PDMS brand Sylgard 184, also known as soft-PDMS or s-PDMS from Dow Corning Inc.) imprint layer that adapts perfectly to the waviness or bow of a substrate [12,[24][25][26], illustrated in Figure 5(a). However, due to the low Young's modulus, high viscosity and swell problem of s-PDMS, hard-PDMS (h-PDMS) which has higher Young's modulus (a Young's modulus of around 9 MPa) and lower viscosity, has been developed as patterned layer material.…”

Section: Various Types Of Soft Moldsmentioning

confidence: 99%

“…The third layer is a thin layer of h-PDMS spin-coated onto the master. One of the advantages of this composite mold is the reduction of the lateral deformation since the patterned layer is closely anchored to the rigid glass plate [12].…”

Section: Various Types Of Soft Moldsmentioning

confidence: 99%

“…As a consequence, 3D nanostructures and fine features of a master mold are difficult to be fully filled which results in a loss of feature height and some defects and uniformity of replicated patterns. Besides, the dimensional change (i.e., thermal shrinkage) due to thermal expansion after thermal curing makes it difficult to apply it for large-area mass production, especially multilevel pattern registration over a large area [10,12,13,26,[34][35][36][37].…”

Section: S-pdmsmentioning

confidence: 99%

“…Since the hardness and resistance to solvent are poor, soft molds have relatively low mold lifetime. These limitations must be solved and overcame for extensive applications [8][9][10][11][12][13].…”

Section: Introductionmentioning

confidence: 99%

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Soft UV Nanoimprint Lithography and Its Applications

Lan¹

2013

Updates in Advanced Lithography

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Additional information is available at the end of the chapter http://dx.doi.org/10.5772/56186 . IntroductionLarμe-area nanopatterninμ tecνnoloμy νas demonstrated νiμν potential wνicν can siμniλi-cantly enνance tνe perλormance oλ many devices and products, sucν as LEDs, solar cells, νard disk drives, laser diodes, display, etc [ ]. For example, nano-patterned sappνire substrates NPSS and pνotonic crystals PνC νave been considered as tνe most eλλective approacνes to improve tνe liμνt output eλλiciency internal quantum eλλiciency and external quantum eλλiciency oλ LEDs and beam sνapinμ [ , ]. Tνe solar cells witν sub-micro anti-reλlective coatinμ exνibited νiμνer pνotocurrent and νiμνer power conversion eλλiciency compared to tνose witνout nanostructures [ ]. Moreover, tνe ability to produce larμe-area micro-and nanostructures on non-planar surλaces is oλ importance λor many applications sucν as optics, optoelectronics, nanopνotonics, imaμinμ tecνnoloμy, NEMS, and microλluidics [ ]. However, creatinμ larμe-area nanostructures on curved or non-planar surλaces are extremely diλλicult usinμ existinμ patterninμ approacνes. Furtνermore, a variety oλ existinμ nanopatterninμ tecνnoloμies sucν as electron beam litνoμrapνy EL" , optical litνoμrapνy, interλerence litνoμrapνy IL , etc., cannot cope witν all tνe practical demands oλ industrial applications witν respect to νiμν resolution, νiμν tνrouμνput, low cost, larμe area, and patterninμ on nonλlat and curved surλace. Tνereλore, new νiμν volume nanomanuλacturinμ tecνnoloμy stronμly needs to be exploited and developed so as to meet tνe tremendous requires oλ rapid μrowinμ markets.Nanoimprint litνoμrapνy NIL νas now been considered as a promisinμ nanopatterninμ metνod witν low cost, νiμν tνrouμνput and νiμν resolution, especially λor producinμ tνe larμe-area micro/nano scale patterns and complex -D structures and as well as νiμν-aspect-ratio λeatures. Due to tνese outstandinμ advantaμes, it was accepted by International Tecνnoloμy Roadmap λor Semiconductors ITRS in λor tνe and nm nodes, scνeduled λor industrial manuλacturinμ in . Tosνiba νas validated NIL λor nm and beyond. NIL νas also been listed as one oλ emerμinμ tecνnoloμies tνat will stronμly impact tνe world by Compared to otνer NIL processes tνermal NIL or νot embossinμ, UV-NIL witν riμid mold and nanopatterninμ metνods, soλt UV-NIL usinμ a λlexible or soλt mold νas been proven to be a very promisinμ approacν λor makinμ larμe-area patterns up to waλer-level in tνe micrometer and nanometer scale, λabricatinμ -D micro/nano structures and νiμν-aspect-ratio λeatures, especially producinμ larμe-area patterns on tνe non-planar surλaces even curved substrates at low-cost and witν νiμν tνrouμνput. Since tνe soλt mold stamp, template is adopted, tνe soλt UV-NIL process νas some unique advantaμes compared witν tνe traditional UV-NIL witν riμid mold. Tνese strenμtνs include Cost reduction. Cνeap soλt molds can be easily replicated λrom one expensive master, siμniλicantly reducinμ cost oλ tνe master template λabrication.Conλorma...

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Section: Various Types Of Soft Moldsmentioning

confidence: 99%

Section: Various Types Of Soft Moldsmentioning

confidence: 99%

Section: S-pdmsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Soft UV Nanoimprint Lithography and Its Applications

Lan¹

2013

Updates in Advanced Lithography

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“…Nanoimprint lithography (NIL) is a promising method of high resolution, high throughput and low cost patterning technique. The NIL process consist a mechanical replication process where surface reliefs from the template are embossed with a thin layer on the substrate [7].…”

Section: Introductionmentioning

confidence: 99%

The Fabrication of PDMS mould for Microelectrode Array Biochip using NIL

Beh

Samsuri

Lee

et al. 2016

IOP Conf. Ser.: Mater. Sci. Eng.

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Abstract. In recent years, low-cost micro and nano fabrication process have gain intention from the manufacturing industry. Biochip is a platform of miniaturized microarrays arranged on a solid substrate that allows various biological tests to achieve immediate results. The development of biochip has established a new platform in biomedical industry. However, to fulfill the demands and availability in the market with affordable cost requires high volume manufacturing techniques for the fabrication of the biochips. In this article we will discuss the fabrication of PDMS mould for replicating microelectrode array of biochip. The fabrication of the microelectrodes utilizes the Nanoimprint lithography (NIL) technique. Finally, the fabrication of PDMS mould has been demonstrated successfully for using Nanoimprint lithography (NIL) technique and achieved 13 % of size difference in overall.

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17.2: Invited Paper: Design of laboratory and production machinery for thermal and UV Nanoimprint for R2R and R2P applications

Kolbusch

Exlager

2019

Symp Digest of Tech Papers

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The application of nanoimprinted surfaces has led to highly improved properties, increased efficiencies of printed and traditional silicon electronical as well as optical devices. While providing a giant potential market for Nanoimprint Lithography (NIL) technologies in functional coatings of screens and touchscreens for mobile devices, fast imprinting of rigid materials has led to major challenges for mass production. For this range of applications with rigid and flexible materials, Coatema has developed a highly advanced set of UV NIL lab and production machinery for both roll‐to‐roll (R2R) and roll‐to‐plate (R2P) applications. Various methods have been applied to meet the recent requirements in accuracy and production speed at the same time. Therefore, Coatema’s latest developments in manufacturing technology for large area R2R and R2P, seamless UV‐ and thermal NIL provide polymer surfaces with light‐guiding, light‐trapping, light‐diffusing or micro lens effects as well as further advanced lithography techniques.

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Nanoimprint Lithography - Next Generation Nanopatterning Methods for Nanophotonics Fabrication

Cited by 12 publications

References 36 publications

Soft UV Nanoimprint Lithography and Its Applications

Soft UV Nanoimprint Lithography and Its Applications

The Fabrication of PDMS mould for Microelectrode Array Biochip using NIL

17.2: Invited Paper: Design of laboratory and production machinery for thermal and UV Nanoimprint for R2R and R2P applications

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