17.2: Invited Paper: Design of laboratory and production machinery for thermal and UV Nanoimprint for R2R and R2P applications

Abstract

The application of nanoimprinted surfaces has led to highly improved properties, increased efficiencies of printed and traditional silicon electronical as well as optical devices. While providing a giant potential market for Nanoimprint Lithography (NIL) technologies in functional coatings of screens and touchscreens for mobile devices, fast imprinting of rigid materials has led to major challenges for mass production. For this range of applications with rigid and flexible materials, Coatema has developed a highly advanced set of UV NIL lab and production machinery for both roll‐to‐roll (R2R) and roll‐to‐plate (R2P) applications. Various methods have been applied to meet the recent requirements in accuracy and production speed at the same time. Therefore, Coatema’s latest developments in manufacturing technology for large area R2R and R2P, seamless UV‐ and thermal NIL provide polymer surfaces with light‐guiding, light‐trapping, light‐diffusing or micro lens effects as well as further advanced lithography techniques.