2002
DOI: 10.1063/1.1470711
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Nanoelectronic devices with reactively fabricated semiconductor

Abstract: Articles you may be interested inThe effect of thermal treatment induced inter-diffusion at the interfaces on the charge trapping performance of HfO2/Al2O3 nanolaminate-based memory devices

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Cited by 6 publications
(2 citation statements)
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“…In this design, the superlattice film was deposited onto a flat and cleaned (dry-etched) Si wafer, and successively a sequence of ZnS-SiO 2 , ferromagnetic TbFeCo, and ZnS-SiO 2 layers, 10 nm thick each, were deposited. By exposure to a focused laser pulse ( λ = 405 nm), the ZnS-SiO 2 /TbFeCo/ZnS-SiO 2 layers inter-diffused, resulting in the formation of an electrical contact pillar [ 23 ] with a diameter of about 400 nm directly connected to both the ferroelectric layer and the phase-change film. Finally, a TiN electrode was deposited on top.…”
Section: Methodsmentioning
confidence: 99%
“…In this design, the superlattice film was deposited onto a flat and cleaned (dry-etched) Si wafer, and successively a sequence of ZnS-SiO 2 , ferromagnetic TbFeCo, and ZnS-SiO 2 layers, 10 nm thick each, were deposited. By exposure to a focused laser pulse ( λ = 405 nm), the ZnS-SiO 2 /TbFeCo/ZnS-SiO 2 layers inter-diffused, resulting in the formation of an electrical contact pillar [ 23 ] with a diameter of about 400 nm directly connected to both the ferroelectric layer and the phase-change film. Finally, a TiN electrode was deposited on top.…”
Section: Methodsmentioning
confidence: 99%
“…We have reported recently 10,11) that the reaction of the RE-TM (TbFeCo) sandwiched between ZnS-SiO 2 dielectric layers reveals anomalous transmittance change with temperature increase, as shown in Fig. 2.…”
Section: Resultsmentioning
confidence: 85%