Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature

Jiang, Ning; Shen, Y.G.; Mai, Yiu‐Wing; Chan, Tai L.; Tung, Simon C.

doi:10.1016/j.mseb.2003.09.033

Cited by 93 publications

(49 citation statements)

References 32 publications

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“…TiN x O y films are the representative transition metal oxynitrides and can be deposited onto different substrates by various chemical vapor deposition (CVD) and physical vapor deposition (PVD) techniques with a tuneable N y O ratio and consequently, with a wide range of physiochemical properties [17][18][19]. Reactive magnetron sputtering is specially an attractive process to deposit TiON films because of its several intrinsic advantages over CVD and PECVD process [20]. The main advantages include low-temperature deposition, large area deposition, and use of non-toxic gas.…”

Section: Introductionmentioning

confidence: 99%

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Padmavathy¹,

Subramanian

Ravidhas³

et al. 2011

J Appl Electrochem

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Titanium oxynitride films were deposited onto commercially pure titanium substrates by direct current reactive magnetron sputtering method using Ti targets and an Ar-N 2 -O 2 mixture discharge gas. The X-ray photoelectron spectroscopy survey spectra on the etched surfaces of TiON films exhibited the characteristic Ti 2p, N 1s, and O 1s peaks at the corresponding binding energies 454.5, 397.0, and 530.7 eV, respectively. The surface topography of these coatings was studied using atomic force microscopy. The characteristic Raman peaks at 200 and 641 cm -1 for the TiN bonds and at 148, 398 ,and 518 cm -1 for the TiO 2 bonds were observed from the Laser Raman spectrometer. The potentiodynamic polarization studies in simulated bodily fluid were performed and the results are reported in this article.

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Section: Introductionmentioning

confidence: 99%

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Padmavathy¹,

Subramanian

Ravidhas³

et al. 2011

J Appl Electrochem

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“…At the same time, the concentration of oxygen decreases due to increasing in film densification and changing a structure type. The observed reduction of surface roughness can be explained by decreasing grain size due to appearing a large amount of atoms after adding a doping element [64]. In addition, surface diffusion leads to smoothing the surface of the coating [65,66].…”

Section: Resultsmentioning

confidence: 99%

Nanocomposite Nb-Al-N coatings: Experimental and theoretical principles of phase transformations

Pogrebnjak

Rogoz

Иващенко

et al. 2017

Journal of Alloys and Compounds

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Phase transformations of Al doped NbN nanocomposite coatings are studied in detail focusing on their microstructural evolution and phase composition. Several techniques such as XRD, SEM, HR-TEM, Nanoindentation and molecular dynamics simulation are employed in order to understand the phase evolution of the Nb-Al-N system. The nanocomposite structures were formed in the coatings, the roughness of the coatings decreased with increasing the Al concentration due to decreasing grain size. First-principles investigation of Nb-Al-N solid solutions was carried out to interpret film properties. It was found, that for small Al fractions, the solid solutions will form in agreement with our experimental results. The spinodal decomposition of Nb-Al-N solid solutions is supposed to be responsible for the formation of the nanocomosite structure observed in the deposited Nb-Al-N films.

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“…Размер этих зёрен контролируется количеством фазы Si 3 N 4 и является причиной, по которой H max достигается при относительно низком содержании в плёнке Si (8-10 ат.%) [7]. Супертвёрдые плёнки Ti-Si-N с низким содержанием Si характеризуются колум-нарной микроструктурой; см., например, одни из последних работ [8][9][10][11][12][13]. Пустоты вокруг колонн формируют почти прямой контакт между окружающей средой на поверхности плёнки и подложки и резко уменьшают стойкость к оксидированию в объёме плёнки и снижают поэтому её барьерную способность.…”

Section: физические свойства и стойкость к высокотемпературному оксидunclassified

“…Более того, многие из них демонстрируют великолепную стойкость к высо-котемпературному оксидированию, к температурам, значительно превышающим 1000С. Например, плёнки Zr-Si-N не подвергаются оксидированию в потоке воздуха до 1300С это не физический предел, а только максимальная температура отжига, используемая в экспе-риментах, о которых сообщает работа [11]. Также известно, что объ-ёмный композит Si 3 N 4 MoSi 2 показывает отличную стойкость к высо-котемпературному оксидированию до 1500С [18][19][20][21].…”

Section: физические свойства и стойкость к высокотемпературному оксидunclassified

Structure, Properties and Fabrication of the Solid Nanocrystalline Coatings Deposited in Several Ways

Beresnev¹,

Pogrebnyak

Azarenkov

et al. 2007

Usp. Fiz. Met.

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Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature

Cited by 93 publications

References 32 publications

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Nanocomposite Nb-Al-N coatings: Experimental and theoretical principles of phase transformations

Structure, Properties and Fabrication of the Solid Nanocrystalline Coatings Deposited in Several Ways

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