2011
DOI: 10.1007/s10800-011-0294-z
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RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Abstract: Titanium oxynitride films were deposited onto commercially pure titanium substrates by direct current reactive magnetron sputtering method using Ti targets and an Ar-N 2 -O 2 mixture discharge gas. The X-ray photoelectron spectroscopy survey spectra on the etched surfaces of TiON films exhibited the characteristic Ti 2p, N 1s, and O 1s peaks at the corresponding binding energies 454.5, 397.0, and 530.7 eV, respectively. The surface topography of these coatings was studied using atomic force microscopy. The cha… Show more

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Cited by 15 publications
(5 citation statements)
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“…bond. 37 Two XPS peaks of S 2p were observed at around 161.6 and 167.4 eV in the TiO 2 -S as shown in Fig. 2c.…”
mentioning
confidence: 89%
“…bond. 37 Two XPS peaks of S 2p were observed at around 161.6 and 167.4 eV in the TiO 2 -S as shown in Fig. 2c.…”
mentioning
confidence: 89%
“…24,27-43 A second, higher energy species is located at 455.9 eV which is attributed to Ti 3+/4+ -O/N bonding or satellite peaks for the Ti 3+ -N species. 24,27,28,34,[37][38][39][40][41][42][43][44][45][46][47][48][49][50][51][52] Given the clear evidence of O on the surface (Fig. 4, lower middle), it is likely this species due to the Ti-O/N species.…”
Section: Surface Analysismentioning
confidence: 99%
“…The intensity of this peak, and the apparent corresponding concentration, maybe a bit misleading given the overlap between the Ti2p1/2 peak originating from the Ti 3+ -N which overlaps with the Ti2p3/2 peak of Ti 4+ -O. 24,27,28,30,33,34,[37][38][39][40][41][43][44][45][46][47][48][49][51][52][53][54][55][56] The O1s data collected for the TiO x N y precursor shows clear evidence for the presence of two O species. The rst O species has a binding energy of $530 eV and is due to the Ti-O bonds evident in the Ti2p data.…”
Section: Surface Analysismentioning
confidence: 99%
“…24 The high amount of adventitious carbon, despite the high vacuum during the XPS measurements, suggests that carbon was deposited on the coating surface during the deposition process or sample storage. 25 Furthermore, carbon and oxygen incorporation might have occurred due to the air contamination when the films were transferred from the sputtering instrument to the XPS sample chamber.…”
Section: Resultsmentioning
confidence: 99%