Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering

Merie, Violeta; Pustan, Marius; Bîrleanu, Corina; Negrea, G.

doi:10.1088/1757-899x/64/1/012025

Cited by 3 publications

(6 citation statements)

References 14 publications

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“…The friction force of thin films can be determined using the lateral mode of AFM investigations according to the following formula [19]:…”

Section: Resultsmentioning

confidence: 99%

“…The influence of the substrate on the topography and the mechanical properties of aluminum, gold and silver thin films was studied in order to analyze if the substrate has an effect on the properties of the deposited films [6,11,13]. Atomic force microscopy (AFM) investigations were performed on an XE-70 AFM (from Park Systems) in a clean room.…”

Section: Methodsmentioning

confidence: 99%

“…Different materials obtained as thin films by means of physical or chemical vapor deposition methods or other technologies can be used for manufacturing microelectronic and microelectromechanical systems (MEMS). Aluminum [1][2][3][4][5][6], gold [7][8][9][10][11][12] and silver [13][14][15][16][17][18] are used in microelectronics and MEMS due to their physical, optical, mechanical, electric and/or magnetic characteristics. Even though the density of these three materials differs significantly from each other: 2.69 g/cm 3 (for aluminum) and 19.32 g/cm 3 (for gold), their Vickers hardness is quite close (15 HV to 25 HV).…”

Section: Introductionmentioning

confidence: 99%

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Nanocharacterization of metallic thin films deposited on different substrates

Merie

Burnete

Bîrleanu

et al. 2020

Materials Science-Poland

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The purpose of this study was to determine the influence of different substrates (C45 steel, polycarbonate, glass) on the topography as well as tribological and mechanical properties (nanohardness, modulus of elasticity and friction force) of aluminum, gold and silver thin films. The 3D image analysis showed a strong influence of the substrate material on the topography of the studied thin films with no certain variation rule. Using the Oliver and Pharr method for determining nanohardness it was observed that, the smallest values were obtained for the thin films deposited on plastic substrate, followed by glass and C45 steel, regardless of the deposited material. The determination of the modulus of elasticity was done using the Hertzian method. The obtained results showed that the highest values of this parameter were obtained for the films deposited on plastic substrate, while the lowest values depended on both the deposited material and substrate. Friction force analysis for aluminum and gold showed a significant impact of the substrate material, with more constant values for gold. As a consequence, one must pay a particular attention when choosing the material for the substrate on which the thin films are deposited.

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“…The friction force of thin films can be determined using the lateral mode of AFM investigations according to the following formula [19]:…”

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Nanocharacterization of metallic thin films deposited on different substrates

Merie

Burnete

Bîrleanu

et al. 2020

Materials Science-Poland

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“…Another interesting solution is the use of diamond-like carbon (DLC). It is a metastable amorphous carbon material with significant sp 3 bonding; DLC shares some of the properties of diamond, such as high hardness, high elastic modulus, and chemical inertness, but it can be produced much more cheaply [20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

Application of ALD Thin Films on the Surface of the Surgical Scalpel Blade

et al. 2021

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The article describes biomaterials and surgical instruments, in particular surgical cutting tools. In addition, the functions of coatings and the layer vapor deposition methods are described. In the experimental component of the study, zinc oxide thin film was deposited on the surgical knife blades by the atomic layer deposition (ALD) method with a varying number of cycles. The structures of the deposited thin films were investigated using a Raman spectrometer and the surface topography of the samples was examined using atomic force microscopy and scanning electron microscopy. The adhesion of the thin films was tested using the micro-scratch method. The corrosion resistance was also tested. Surgical instruments coated with non-allergenic metal oxide coatings, containing metal structures that reduce the growth of bacteria, could significantly decrease the risk of undesirable reactions of the body during and after surgery.

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“…Merie et al [17] observed that increasing of the temper ature from room temperature to 250 °C decreases the roughness and increases the hardness of titanium nitride. Abadias et al [18] observed that increase of negative bias applied to the substrate increases the adatom mobility and compressive stress and degrades the (200) preferred orientation.…”

Section: Introductionmentioning

confidence: 99%

Structural and morphological properties of TiN deposited by magnetron sputtering

Ghasemi

Farhadizadeh

Amadeh

et al. 2018

Surf. Topogr.: Metrol. Prop.

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This work studied the simultaneous effect of multiple parameters on the microstructure and topography of TiN thin films deposited by reactive unbalanced DC magnetron sputtering. The simultaneous influence of deposition parameters including pressure, temperature, and power on crystallite size, texture coefficient, microstructure, and roughness parameters was investigated using design of experiments (DoE): the Taguchi method. The results showed that the mean crystallite size of ( 111) and ( 200) planes increase when the temperature and cathode power increase. Furthermore, the increase of cathode power from 50 to 150 W augments the mean of root mean square height (Sq) from 2 to 10 nm. However, the substrate temperature has no considerable effect on the roughness parameters of the surface. Cathode power has also a prominent influence on the skewness of deposited layers in which it abruptly decreases when the power changes from 100 W to 150 W. In other words, all samples deposited at 150 W have negative skewness. It was also shown that the deposition rate is mainly controlled by the cathode power.

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Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering

Cited by 3 publications

References 14 publications

Nanocharacterization of metallic thin films deposited on different substrates

Nanocharacterization of metallic thin films deposited on different substrates

Application of ALD Thin Films on the Surface of the Surgical Scalpel Blade

Structural and morphological properties of TiN deposited by magnetron sputtering

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