Nano‐scale pattern formation on the surface of HgCdTe produced by ion bombardment

Abstract

Presented in this work are the results concerning formation of nano‐scale patterns on the surface of a ternary compound Hg1–xCdxTe (x ∼ 0.223). Modification of this ternary chalcogenide semiconductor compound was performed using the method of oblique‐incidence ion bombardment with silver ions, which was followed by low‐temperature treatment. The energy and dose of implanted ions were 140 keV and 4.8×1013 cm‐2, respectively. Atomic force microscopy methods were used for the surface topography characterization. The structural properties of MCT‐based structure was analyzed using double and triple crystal X‐ray diffraction to monitor the disorder and strain of the implanted region as a function of processing conditions. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)