N₂(SiCl₃)₄ – ein Hydrazinderivat als unerwartetes Produkt der Reaktion von N₂ mit SiCl₄

Use of plasma-activated gases in synthesis of solid-state nitrides

“…42 Even metastable materials, such as ternary Ti 1-x Al x N coatings, can be realized due to relatively low processing temperatures of 510 • C. 43 In some cases it is possible to isolate and characterize metastable intermediate products on the way towards nitride formation, such as (SiCl 3 ) 2 N-N(SiCl 3 ) 2 and other species in a microwave-induced plasma in a mixture of N 2 and SiCl 4 . 44,45 In our investigations towards plasma-assisted synthesis of nitrides it was also possible to obtain new, metastable materials such as Ta 2 N 3 46 using the PECVD method. Interestingly, this…”