2004
DOI: 10.1016/j.surfcoat.2003.09.040
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Multiscale modeling of CVD film growth—a review of recent works

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Cited by 60 publications
(35 citation statements)
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“…Seven different sizes were simulated, i.e. of side 2,4,8,16,32,64, and 128 nm, and the film thickness has been kept constant at nm 2 for all sizes. The temperature range was K 750 50 − , with an interval of K 10 within the temperature range of K 550 250 − and with K 50 interval for the remaining temperature range.…”
Section: Molecular Dynamics (Md) Simulationsmentioning
confidence: 99%
“…Seven different sizes were simulated, i.e. of side 2,4,8,16,32,64, and 128 nm, and the film thickness has been kept constant at nm 2 for all sizes. The temperature range was K 750 50 − , with an interval of K 10 within the temperature range of K 550 250 − and with K 50 interval for the remaining temperature range.…”
Section: Molecular Dynamics (Md) Simulationsmentioning
confidence: 99%
“…The traditional procedure to perform sequential multiscale modelling is to solve first the finer scales and then passing on the information from this small scale to the coarser scales (bottom-up approach). This approach has been extensively used to study several engineering applications, especially those related to the nucleation and growth of solid materials at the micro and nanoscale level, for example chemical vapour deposition (Rodgers and Jensen, 1998;Dollet, 2004;Moscatelli et al, 2005), microdefect formations in crystal growth (Sinno and Brown, 1999), void formation in metallic thinfilm interconnects (Gungor et al, 1999) and in sputter deposition for giant-magneto-resistive thin films (Ghosal et al, 2004).…”
Section: Sequential Multiscale Approachmentioning
confidence: 99%
“…However, reviews that address typical multiscale problems found in specific areas in engineering and science are currently available. For example Sherwood et al (2008) published a review with the multiscale modelling methods for bio-molecular systems, Dollet (2004) published a review on multiscale problems found in different Chemical Vapour Deposition (CVD) processes, Muller-Plathe (2002) published a review that focused on multiscale problems found in polymers science, Raimondeau and Vlachos (2002) revised multiscale problems in reaction engineering, Vlachos (2005) made a review on multiscale problems that arise in systems biology and materials science.…”
Section: Introductionmentioning
confidence: 99%
“…An effective reactivity map indicates the change in the local effective reactivity over the source plane. Knowing this, the local effective reactivity can be calculated as Equation 4.…”
Section: Generation Of Effective Reactivity Mapmentioning
confidence: 99%
“…However, this method of coupling is inaccurate because surface topography can greatly increase the surface area exposed to the gas, which may increase the deposition reaction rate. [4] This means that in order to have an accurate multi-scale model there must be bi-directional coupling. When the scales are bi-directionally coupled information is passed to and from both scales.…”
Section: Introductionmentioning
confidence: 99%