1988
DOI: 10.1063/1.340429
|View full text |Cite
|
Sign up to set email alerts
|

Multiply stripped ion generation in the metal vapor vacuum arc

Abstract: We consider the charge state distribution of ions produced in the metal vapor vacuum arc plasma discharge. A new kind of high current metal ion source in which the ion beam is extracted from a metal vapor vacuum arc plasma has been used to obtain the spectra of multiply charged ions produced within the cathode spots. The cathode materials used and the species reported on here are: C, Mg, Al, Si, Ti, Cr, Fe, Co, Ni, Cu, Zn, Zr, Nb, Mo, Rh, Pd, Ag, In, Sn, Gd, Ho, la, W, Pt, Au, Pb, Th, and U; the arc current wa… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

4
33
0

Year Published

1989
1989
2017
2017

Publication Types

Select...
8
1
1

Relationship

1
9

Authors

Journals

citations
Cited by 194 publications
(37 citation statements)
references
References 42 publications
4
33
0
Order By: Relevance
“…Electron beam ion sources [9] especially with the high power evaporator/target heating systems seem also suitable for production of ions of non-volatile elements [10]. Very popular tools are dierent versions of high power MEVVA-type arc discharge ion source [11]. Recently, compact arc discharge ion sources equipped with an internal evaporator have been proposed [1215].…”
Section: Production Of Momentioning
confidence: 99%
“…Electron beam ion sources [9] especially with the high power evaporator/target heating systems seem also suitable for production of ions of non-volatile elements [10]. Very popular tools are dierent versions of high power MEVVA-type arc discharge ion source [11]. Recently, compact arc discharge ion sources equipped with an internal evaporator have been proposed [1215].…”
Section: Production Of Momentioning
confidence: 99%
“…Cathode i.;aterials were yttrium and titanium; in the first experiment we simply implanted yttrium into silicon and in the second experiment we fabricated an yttrium-titanium multilayer structure with ion beam mixing at some of the interfaces. Previous work [14,15] has shown that the metal plasma generated in this way is multiply ionized, with mean charge state Q of 2.3 for yttrium and 2.1 for titanium. Thus, when implanted, the mean ion energy is greater than the applied pulse voltage by this factor.…”
mentioning
confidence: 99%
“…This approach was successfully applied in our previous design [12,13], combining features of Nielsen [3] and metal vapor arc discharge (MEVVA [14]) ion sources. The molybdenum crucible, often called an evaporator, is surrounded by a spiral cathode.…”
Section: Introductionmentioning
confidence: 99%