2020
DOI: 10.1021/acsami.9b21030
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Multiple Resonance Metamaterial Emitter for Deception of Infrared Emission with Enhanced Energy Dissipation

Abstract: Artificial camouflage surfaces for assimilating with the environment have been utilized for controlling optical properties. Especially, the optical properties of infrared (IR) camouflage materials should be satisfied with two requirements: deception of IR signature in a detected band through reduced emissive energy and dissipation of reduced emissive energy for preventing thermal instability through an undetected band. Most reported articles suggest the reduction of emissive energy in the detected band; howeve… Show more

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Cited by 38 publications
(45 citation statements)
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“…It is difficult to use IR camouflage materials in case of flexible polymers because the dielectric layer has lots of lattice resonance in IR band which induces unwanted resonances. [ 37,45 ] Hence, the structure of IR camouflage materials should be changed, such as disconnecting the brittle part to reduce the mechanical stress. [ 42 ] As a dielectric layer, silicon nitride (Si 3 N 4 ) was adopted for FAM.…”
Section: Resultsmentioning
confidence: 99%
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“…It is difficult to use IR camouflage materials in case of flexible polymers because the dielectric layer has lots of lattice resonance in IR band which induces unwanted resonances. [ 37,45 ] Hence, the structure of IR camouflage materials should be changed, such as disconnecting the brittle part to reduce the mechanical stress. [ 42 ] As a dielectric layer, silicon nitride (Si 3 N 4 ) was adopted for FAM.…”
Section: Resultsmentioning
confidence: 99%
“…Ti was used as an adhesive layer which did not affect the FIRE performance. [19,28,33,37] The silicon nitride for a dielectric layer and Au/Ti layers for metal patterns were deposited by plasma enhanced chemical vapor deposition (PECVD, Plasma Therm 790 Series, Plasma Therm USA) and E-beam evaporator after lifting off the photoresist, respectively. Photoresist patterns were fabricated on metal (Au)-dielectric (Si 3 N 4 )-metal (Au) layers for disk structure by controlling the magnitude of exposure dose (50-200 mJ cm −2 ) by varying the diameter of the unit cell.…”
Section: Methodsmentioning
confidence: 99%
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