Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes

Abstract

Ni/Au electrodes with single, twined and triplet hole array patterns light-emitting diodes have been fabricated by multiple-exposure colloidal lithography. It is found that 45.6%, 83.6% and 15.5% improvement in light output at 350 mA has been achieved by patterning Ni/Au electrodes with single, twined, triplet hole arrays. In addition, patterned Ni/Au LEDs possess much larger view angles than non-patterned ones due to scattering effects of light around the holes, especially for triplet hole array patterned Ni/Au LEDs. Our proposed method for fabricating multiple holes structure would be very promising to improve light output power of LEDs when using advanced electrodes.

Colloidal nanophotonics: the emerging technology platform

“…A noticeable portion of contributed works is related to colloidal lithography as cheap and affordable technique providing fabrication of submicron nanorelief without traditional nanolithographical templating. Z. Xiong et al [15] applied colloidal lithography to patterning of metal electrodes in GaN-based LEDs to enhance light extraction. J.-H. Min et al [16] demonstrate a way to develop 3D-periodic structure by using lithography with a 2D-periodic colloidal array.…”