2011
DOI: 10.1038/nchem.965
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Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time

Abstract: Recent advances in materials science have made it possible to perform photolithography at the nanoscale using visible light. One approach to visible-light nanolithography (resolution augmentation through photo-induced deactivation) uses a negative-tone photoresist incorporating a radical photoinitiator that can be excited by two-photon absorption. With subsequent absorption of light, the photoinitiator can also be deactivated before polymerization occurs. This deactivation step can therefore be used for spatia… Show more

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Cited by 58 publications
(48 citation statements)
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“…The acrylic resin used was composed of 49 wt% Tris(2-hydroxyethyl) isocyanurate triacrylate (SR368; Sartomer), 49 wt% ethoxylated (6) trimethylolpropane triacrylate (SR499; Sartomer), and 2 wt% Lucirin TPO-L (Ciba). Master structures were fabricated on acrylate-functionalized glass slides (32). The typical power of the fabrication beam was 4 mW as measured at the sample.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The acrylic resin used was composed of 49 wt% Tris(2-hydroxyethyl) isocyanurate triacrylate (SR368; Sartomer), 49 wt% ethoxylated (6) trimethylolpropane triacrylate (SR499; Sartomer), and 2 wt% Lucirin TPO-L (Ciba). Master structures were fabricated on acrylate-functionalized glass slides (32). The typical power of the fabrication beam was 4 mW as measured at the sample.…”
Section: Methodsmentioning
confidence: 99%
“…The typical power of the fabrication beam was 4 mW as measured at the sample. The sample preparation and fabrication procedure have been described previously (32). The master surfaces were functionalized with primary amines using a mixture of ethylenediamine (E26266; Sigma-Aldrich) and ethanol (1:4, vol/vol) for 30 min, and then were treated with a solution containing 0.03 g of perfluorooctadecanoic acid (L16837; Alfa Aesar), 4.5 g of hexafluorobenzene (H8706; Sigma-Aldrich), 16 mL of ethanol, and 50 μL of methanol for 1.5 h to render the surface highly hydrophobic, facilitating the release of cured polydimethylsiloxane (PDMS).…”
Section: Methodsmentioning
confidence: 99%
“…[19][20][21] DLW by multiphoton polymerization is a direct laser writing technique that allows the construction of 3D structures with resolution beyond the diffraction limit. [22][23][24] The polymerization process is due to nonlinear absorption within the focal volume, initiated by a focused ultrafast laser beam. Employing laser intensities that are only slightly above the nonlinear polymerization threshold, structures with very high resolution can be made.…”
mentioning
confidence: 99%
“…Recent developments in the engineering and manipulation of materials on the nanoscale have given rise to a number of new techniques with the potential for physically encoding data and images into optically readable volumes and surfaces. [23,24] Using semiconductor quantum dots, [25][26][27] graphene, [28] and various super-resolution lithography techniques, [29][30][31][32][33][34] researchers are demonstrating novel 2D and 3D techniques that may enable the next generation of optical storage and encoding technologies. Plasmonic particles and filters have also seen applications in these research areas, with the aforementioned image encoding examples having been joined by demonstrations of their use in optical data storage.…”
mentioning
confidence: 99%