Multilayered mirrors based on La/B4C(B9C) for X-ray range near anomalous dispersion of boron (λ≈6.7nm)

Andreev, S. S.; Барышева, М. М.; Чхало, Н. И.; Gusev, S. A.; Pestov, A. E.; Полковников, В. Н.; Салащенко, Н. Н.; Shmaenok, L. A.; Vainer, Yu. A.; Zuev, S. Yu.

doi:10.1016/j.nima.2008.12.165

Cited by 38 publications

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“…Multilayer mirrors near the B Kedge are of interest for x-ray analysis of boron content in doped semiconductors, plasma diagnostics, and lithography. Few multilayer combinations like Ru∕B 4 C [2], La∕B 4 C [3][4][5][6], Mo/B [7], Mo∕B 4 C [8,9], and Pd∕B 4 C [10] were studied near the B K-edge. Boron-based multilayers are a promising combination for optics near the B K-edge.…”

Section: Introductionmentioning

confidence: 99%

“…Since pure boron has low sputtering rate because of its low conductivity, Mo/ B [7] was only the studied combination near the B K-edge. In practice, some carbides like B 4 C and B 9 C are used as spacer elements instead of pure boron [2][3][4][5][6][8][9][10]. The multilayer combinations were chosen based on selection criteria, i.e., high optical contrast between absorber and spacer elements as well as low absorption in both spacer and absorber elements.…”

Section: Introductionmentioning

confidence: 99%

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Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge

et al. 2013

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A multilayer structure consisting of alternate layers of W and B4C has been deposited using a magnetron sputtering system. The structure of the as-deposited and vacuum-annealed W/B4C multilayer sample has been characterized using grazing incidence x-ray reflectivity, grazing incidence diffraction, and the normal incidence reflectivity has been measured using synchrotron radiation. A two-layer model consisting of tungsten and boron carbide is presented. The multilayer structure was found to be stable after 800°C annealing. Grazing incidence x-ray diffraction measurements suggested that W is polycrystalline with small grain size. No signature of tungsten carbide or tungsten boride formation could be observed during the annealing treatments. A near normal incidence soft x-ray reflectivity (SXRR) of ~8.3% was obtained at 6.8 nm wavelength. A little drop (~1%) in SXRR after 800°C annealing suggested that there were no compositional changes within the layers during the annealing treatments.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge

et al. 2013

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“…9 Near normal reflectivity of about 36-40% was obtained from MLs of La/B 4 C and La/B 9 C for different period values. 10 Maximum peak reflectivity of 48.9% from the La/B 4 C multilayer at 6.68 nm and 39.2% from La 2 O 3 /B 4 C at the same wavelength was reported by Platonov et al 11 The 6.x nm MLs research has shown a leap recently after Kuznetsov a) sertsu@dei.unipd.it 0021-8979/2016/119(9)/095301/7/$30.00…”

Section: Introductionmentioning

confidence: 81%

Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

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et al. 2016

Journal of Applied Physics

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Articles you may be interested inMicrostructure and composition analysis of low-Z/low-Z multilayers by combining hard and resonant soft X-ray reflectivity J. Appl. Phys. 119, 245301 (2016) New multilayers of boron carbide/cerium dioxide (B 4 C/CeO 2 ) combination on silicon (Si) substrate are manufactured to represent reflective-optics candidates for future lithography at 6.x nm wavelength. This is one of only a few attempts to make multilayers of this kind. Combination of several innovative experiments enables detailed study of optical properties, structural properties, and interface profiles of the multilayers in order to open up a room for further optimization of the manufacturing process. The interface profile is visualized by high-angle annular dark-field imaging which provides highly sensitive contrast to atomic number. Synchrotron based at-wavelength extreme ultraviolet (EUV) reflectance measurements near the boron (B) absorption edge allow derivation of optical parameters with high sensitivity to local atom interactions. X-ray reflectivity measurements at Cu-K alpha ð8 keV) determine the period of multilayers with high in-depth resolution. By combining these measurements and choosing robust nonlinear curve fitting algorithms, accuracy of the results has been significantly improved. It also enables a comprehensive characterization of multilayers. Interface diffusion is determined to be a major cause for the low reflectivity performance. Optical constants of B 4 C and CeO 2 layers are derived in EUV wavelengths. Besides, optical properties and asymmetric thicknesses of inter-diffusion layers (interlayers) in EUV wavelengths near the boron edge are determined. Finally, ideal reflectivity of the B 4 C/CeO 2 combination is calculated by using optical constants derived from the proposed measurements in order to evaluate the potentiality of the design. V C 2016 AIP Publishing LLC.

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“…of the 'sensitivity' of the reflection curve to the differences in the smearing functions is already satisfied at > 0:5=4 nm À1 ¼ 0:125 nm. In fact, the effective transition layers in real structures are broader; the most common values of lie within the limits 0.2-1.5 nm (Andreev et al, 2009;Haase et al, 2016;Chkhalo et al, 2017).…”

Section: Influence Of Interlayer Shape On X-ray Reflectivitymentioning

confidence: 99%

“…Nevertheless, this is not enough in some problems. For example, to describe multilayer periodic mirrors based on La and B, a model of linear transition layers between the materials has proven to be very useful (Andreev et al, 2009;Makhotkin et al, 2013). But Zameshin et al (2016), when comparing LaN/B and LaN/La/B structures with an La thickness of 0.3 nm, found the model of linear transition layers to be completely useless for comparison of the permittivity profiles of slightly different structures, in spite of the more or less reasonable coincidence of resonant reflection peaks.…”

Section: Introductionmentioning

confidence: 99%

Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data

et al. 2017

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An extended model for the reconstruction of multilayer nanostructures from reflectometry data in the X-ray and extreme ultraviolet ranges is proposed. In contrast to the standard model approach, where the transitional region is defined in advance as a specific function, the transition layer is sought as a linear combination of several functions at once in the extended model. This allows one to describe a much wider class of multilayer structures with different dominant physical mechanisms for the formation of transition regions. The extended model occupies an intermediate position between the classical model approach and the so-called model-free methods. The efficiency of the described method is illustrated in detail in numerical simulations and in a real experiment on the annealing of a multilayer Mo/Be mirror.research papers

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Multilayered mirrors based on La/B4C(B9C) for X-ray range near anomalous dispersion of boron (λ≈6.7nm)

Cited by 38 publications

References 5 publications

Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge

Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge

Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data

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Multilayered mirrors based on La/B4C(B9C) for X-ray range near anomalous dispersion of boron (λ≈6.7nm)

Cited by 38 publications

References 5 publications

Stability and normal incidence reflectivity of W/B4C multilayer mirror near the boron K absorption edge

Stability and normal incidence reflectivity of W/B4C multilayer mirror near the boron K absorption edge

Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data

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Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge

Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge