2017
DOI: 10.1016/j.spmi.2016.12.041
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Multilayer porous structures of HVPE and MOCVD grown GaN for photonic applications

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Cited by 19 publications
(10 citation statements)
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“…However, since the generation of pits in an HVPE process is not totally controlled, such self‐organized processes do not allow preparation of multilayer porous structure in a reliable controlled fashion. It was proposed to fabricate multilayer porous structures on the basis of samples grown by metal–organic chemical vapor‐phase deposition (MOCVD), [ 61 ] as shown in Figure 6c,d.…”
Section: Optical and Photonic Properties Of Wide‐bandgap Semiconducto...mentioning
confidence: 99%
“…However, since the generation of pits in an HVPE process is not totally controlled, such self‐organized processes do not allow preparation of multilayer porous structure in a reliable controlled fashion. It was proposed to fabricate multilayer porous structures on the basis of samples grown by metal–organic chemical vapor‐phase deposition (MOCVD), [ 61 ] as shown in Figure 6c,d.…”
Section: Optical and Photonic Properties Of Wide‐bandgap Semiconducto...mentioning
confidence: 99%
“…Its wide bandgap makes it also very promising for applications at the telecommunication wavelength of 1550 nm, for which both the twoand the three-photon absorption cannot take place. Electromagnetic interference shielding in an ultra-broad range of frequencies, distributed Bragg reflectors and UV-light driven fluorescent microengines are among the emergent applications of this compound when engineered in three-dimensional nanoarchitectures [10][11][12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…These devices can be a high-power transistor [16,17], optical device with a short wavelength [18], photo-detector [19], light emitting diode (LED) device [20][21][22], solar cell [23,24], pH sensor [25] and betavoltaic device [26]. Many thin film deposition techniques can be used to grow high-quality GaN thin films including pulsed laser deposition [27], metal-organic chemical vapour deposition [28], atomic layer deposition [29], molecular beam epitaxy (MBE) [30], thermionic vacuum arc [31,32], sputtering [33] and sol-gel [34]. Radio frequency (RF) magnetron sputtering has emerged as a useful method for producing high-quality GaN thin films at lower temperature [35].…”
Section: Introductionmentioning
confidence: 99%