2019
DOI: 10.1088/1367-2630/ab0e46
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Multilayer ion trap technology for scalable quantum computing and quantum simulation

Abstract: We present a novel ion trap fabrication method enabling the realization of multilayer ion traps scalable to an in principle arbitrary number of metal-dielectric levels. We benchmark our method by fabricating a multilayer ion trap with integrated three-dimensional microwave circuitry. We demonstrate ion trapping and microwave control of the hyperfine states of a laser cooled 9 Be + ion held at a distance of 35 m m above the trap surface. This method can be used to implement large-scale ion trap arrays for scala… Show more

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Cited by 23 publications
(20 citation statements)
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References 44 publications
(63 reference statements)
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“…The surface-electrode trap was fabricated at the PTB cleanroom facility employing the single-layer method as detailed in ref. 27 on an AlN substrate (for the present trap, we chose the single-layer process in order to quickly test improvements that were made to the setup and trap orientation compared with ref. 28 ).…”
Section: Resultsmentioning
confidence: 99%
“…The surface-electrode trap was fabricated at the PTB cleanroom facility employing the single-layer method as detailed in ref. 27 on an AlN substrate (for the present trap, we chose the single-layer process in order to quickly test improvements that were made to the setup and trap orientation compared with ref. 28 ).…”
Section: Resultsmentioning
confidence: 99%
“…Our group at the Leibniz University of Hannover (LUH) and the Physikalisch-Technische Bundesanstalt (PTB) is focused on developing surface-electrode Paul traps for quantum information processing applications. We have established a simulation and production line for these types of traps and run an experiment at PTB in which these traps are used to drive two-qubit gates [42,43,44,23,45,46]. While the gate fidelities that our group can achieve improved over time [47,48] and the manufacturing capabilities are developed to a point that allows for production of larger scale traps, they still lack operation in a cryogenic environment.…”
Section: Thesis Outlinementioning
confidence: 99%
“…Ref. [103] demonstrated a polymer-based, spin-on dielectric for ion trap fabrication, which allowed for thick dielectric layers. The deposition of the top metal layer (M2) can be performed by using conventional microfabrication processes including electroplating, sputtering, evaporation (Fig.…”
Section: Standard Fabrication Processes For Ion Trapsmentioning
confidence: 99%