Multilayer Fresnel zone plate for soft X-ray microscopy resolves sub-39 nm structures

Mayer, Marcel; Grévent, Corinne; Szeghalmi, Adriana; Knez, Mato; Weigand, Markus; Rehbein, Stefan; Schneider, Gerd; Baretzky, B.; Schütz, Gisela

doi:10.1016/j.ultramic.2011.09.003

Cited by 42 publications

(42 citation statements)

References 44 publications

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“…The ML‐FZP was mounted on a Mo lift‐out grid in the dual beam instrument by using a micromanipulator. Prior to FIB slicing a protective layer of Pt was coated over the FZP by FIB induced deposition (FIBID) (Figure 1g) 39, 45. The ML‐FZP was thinned down to an optical thickness of 700 nm via Ga + FIB, which is optimized for the soft X‐ray range.…”

Section: Resultsmentioning

confidence: 99%

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3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

et al. 2018

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Focusing X‐rays to single nanometer dimensions is impeded by the lack of high‐quality, high‐resolution optics. Challenges in fabricating high aspect ratio 3D nanostructures limit the quality and the resolution. Multilayer zone plates target this challenge by offering virtually unlimited and freely selectable aspect ratios. Here, a full‐ceramic zone plate is fabricated via atomic layer deposition of multilayers over optical quality glass fibers and subsequent focused ion beam slicing. The quality of the multilayers is confirmed up to an aspect ratio of 500 with zones as thin as 25 nm. Focusing performance of the fabricated zone plate is tested toward the high‐energy limit of a soft X‐ray scanning transmission microscope, achieving a 15 nm half‐pitch cut‐off resolution. Sources of adverse influences are identified, and effective routes for improving the zone plate performance are elaborated, paving a clear path toward using multilayer zone plates in high‐energy X‐ray microscopy. Finally, a new fabrication concept is introduced for making zone plates with precisely tilted zones, targeting even higher resolutions.

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Section: Resultsmentioning

confidence: 99%

“…A recent method for producing ML‐FZPs is based on atomic layer deposition (ALD) of multilayers over optical quality glass fibers 45. The ALD process allows atomic scale precision in zone thickness and excellent conformality through its sequential, self‐limiting surface reactions that lead to cycle based growth 46.…”

Section: Introductionmentioning

confidence: 99%

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

et al. 2018

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“…The combination of Al 2 O 3 and Ta 2 O 5 is a robust one for the fabrication of a ML-FZP via the atomic layer deposition (ALD) technique, as already demonstrated [24]. Alumina and Tantalum(V)Oxide were deposited via well-established ALD processes and resulted in sharp layer interfaces [24] and a smooth coverage around the fiber circumference.…”

Section: Structure Of the Multilayer Fresnel Zone Platementioning

confidence: 87%

“…ML-FZPs with 35 nm Δr and 38 µm diameter were fabricated by depositing alternating layers of Al 2 O 3 and Ta 2 O 5 with a total thickness of 4 µm on a 30 µm diameter glass fiber (A2 by SCHOTT AG, Germany) via atomic layer deposition (ALD) as described previously [24]. The resulting multilayer coated fibers were cut, via a focused ion beam (FIB) system (Nova NanoLab, FEI, The Netherlands) to thicknesses optimized for either hard (HXR-FZP, 5.9 µm thick) or soft X-rays (SXR-FZP, 1.6 µm thick).…”

Section: Fabrication Of the Ml-fzpsmentioning

confidence: 99%

“…Recently, there have been improvements in focusing of HXR via various diffractive optics such as, multilayer Laue lenses, lithographic and multilayer FZPs achieving high resolutions and efficiencies [1,[16][17][18][19][20][21][22][23]. FZPs based on multilayer fabrication techniques (ML-FZPs) where a fiber core is coated with a multilayer and sliced to deliver the ML-FZP, overcome the problem of achieving a high aspect ratio by the nature of the fabrication method [19,[24][25][26][27][28][29][30][31][32]. During the ML-FZP fabrication, one can advantageously vary the ML-FZP thickness freely, enabling the fabrication of ML-FZPs with very high aspect ratios, i.e.…”

Section: Introductionmentioning

confidence: 99%

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Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Keskinbora¹,

Robisch²,

Mayer³

et al. 2014

Opt. Express

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X-ray microscopy is a successful technique with applications in several key fields. Fresnel zone plates (FZPs) have been the optical elements driving its success, especially in the soft X-ray range. However, focusing of hard X-rays via FZPs remains a challenge. It is demonstrated here, that two multilayer type FZPs, delivered from the same multilayer deposit, focus both hard and soft X-rays with high fidelity. The results prove that these lenses can achieve at least 21 nm half-pitch resolution at 1.2 keV demonstrated by direct imaging, and sub-30 nm FWHM (fullpitch) resolution at 7.9 keV, deduced from autocorrelation analysis. Reported FZPs had more than 10% diffraction efficiency near 1.5 keV. ©2014 Optical Society of AmericaOCIS codes: (340.7460) X-ray microscopy; (340.0340) X-ray optics; (340.6720) Synchrotron radiation; (340.7480) X-rays, soft x-rays, extreme ultraviolet (EUV); (050.1965) Diffractive lenses; (220.4241) Nanostructure fabrication. References and links1. J. Vila-Comamala, Y. Pan, J. J. Lombardo, W. M. Harris, W. K. S. Chiu, C. David, and Y. Wang, "Zonedoubled Fresnel zone plates for high-resolution hard X-ray full-field transmission microscopy," J. Synchrotron Radiat. 19(5), 705-709 (2012). 2. E. Zschech, C. Wyon, C. E. Murray, and G. Schneider, "Devices, materials, and processes for nanoelectronics: characterization with advanced x-ray techniques using lab-based and synchrotron radiation sources," Adv. Eng. Mater. 13(8), 811-836 (2011 Schütz, "Fast spin-wave-mediated magnetic vortex core reversal," Phys. Rev. B 86(13), 134426 (2012). 5. J. Kirz and C. Jacobsen, "The history and future of X-ray microscopy," J. Phys. Conf. Ser. 186, 012001 (2009). 6. P. Kirkpatrick and A. V. Baez, "Formation of optical images by X-Rays," J. Opt. Soc. Am. 38(9), 766-774 (1948 International Journal of Optics 31(4), 403-413 (1984). 46. A. A. Michelson, Studies in Optics (Dover Publications, Incorporated, 1995. 47. G. R. Morrison, "Phase contrast and darkfield imaging in x-ray microscopy," Proc. SPIE 1741, 186-193 (1993).

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Atomic Layer Deposition

Ghazaryan

Pfeiffer

Schmitt

et al. 2020

Digital Encyclopedia of Applied Physics

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Atomic layer deposition (ALD) is a key coating technology which enables conformal coatings on high aspect ratio substrates. In addition, it allows for a precise thickness control of thin films, multilayers, and nanolaminates. It is a chemical coating technology where the precursors are introduced sequentially in the reactor or are spatially separated. Herein, basic principles of ALD are introduced, reactor geometries are overviewed, and typical ALD materials and applications are summarized. ALD thin films are one pillar of modern computer technologies where ultra‐thin, conformal coatings with exceptional physical, electrical, and chemical properties are essential. Numerous emerging applications have been demonstrated and some are already in mass‐production. Precursor and process development, tool design and engineering, extensive thin‐film optimization, the search for better materials and composites combined with expert knowledge in the application fields have led to this success.

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Multilayer Fresnel zone plate for soft X-ray microscopy resolves sub-39 nm structures

Cited by 42 publications

References 44 publications

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Atomic Layer Deposition

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