Multilayer deposition and EUV reflectance characterization of 131 ? flight mirrors for AIA at LLNL

Abstract

Mo/Si multilayer coatings reflecting at 131 Å were deposited successfully on the AIA primary and secondary flight mirrors and on two coating witness Si wafers, on November 16, 2005, at LLNL. All coatings were characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL, and were found to be well within specifications.