2008
DOI: 10.1002/adma.200702035
|View full text |Cite
|
Sign up to set email alerts
|

Multicolor Polymer Nanocomposites: In Situ Synthesis and Fabrication of 3D Microstructures

Abstract: Microstereolithography (MSL) is an emerging technology, which is expected to play a key role in the fabrication of micro-and nanoelectronic machines and micro-and nanoelectromechanical systems (MEMS/NEMS).[1] Of the various MSL techniques, multiphoton photopolymerization (MPP) [2][3][4][5][6] has attracted widespread interest owing to its potential use in fabricating intrinsic 3D microstructures such as 3D photonic crystals (PhCs). [7][8][9][10][11] Much effort at developing MPP-MSL has been devoted to improvi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
82
0
2

Year Published

2011
2011
2022
2022

Publication Types

Select...
5
4
1

Relationship

0
10

Authors

Journals

citations
Cited by 134 publications
(88 citation statements)
references
References 31 publications
1
82
0
2
Order By: Relevance
“…[ 10 ] An ultrafi ne line width of ≈40 nm and relatively high fabrication throughput with writing speeds of 1-5 cm s −1 have been reported recently. [ 11 ] Furthermore, TPP lithography was found to be an ideal tool for developing 3D functional architectures using composite resins doped with various functional materials, including photoisomerizable dyes, [ 12 ] semiconductor nanoparticles, [ 13 ] metallic nanoparticles, [ 14 ] and magnetic nanoparticles. [ 15 ] Besides photopolymerization, various other photochemical/photophysical mechanisms can be also used in micro/nanodevice fabrication, including photoisomerization, [ 16 ] photoreduction, [ 17 ] photo-precipitation of sol-gel, [ 18 ] and other novel laser-induced photochemical transformation processes.…”
Section: It Is Diffi Cult To Develop Tpp-compatible Photoresists Withmentioning
confidence: 99%
“…[ 10 ] An ultrafi ne line width of ≈40 nm and relatively high fabrication throughput with writing speeds of 1-5 cm s −1 have been reported recently. [ 11 ] Furthermore, TPP lithography was found to be an ideal tool for developing 3D functional architectures using composite resins doped with various functional materials, including photoisomerizable dyes, [ 12 ] semiconductor nanoparticles, [ 13 ] metallic nanoparticles, [ 14 ] and magnetic nanoparticles. [ 15 ] Besides photopolymerization, various other photochemical/photophysical mechanisms can be also used in micro/nanodevice fabrication, including photoisomerization, [ 16 ] photoreduction, [ 17 ] photo-precipitation of sol-gel, [ 18 ] and other novel laser-induced photochemical transformation processes.…”
Section: It Is Diffi Cult To Develop Tpp-compatible Photoresists Withmentioning
confidence: 99%
“…TPP lithography is also an ideal tool for developing nanomaterials/polymer composite based micro/nano-structures. Photoisomerizable dyes [30], semiconductor nanoparticles [31,32], metallic nanoparticles [33,34], and magnetic nanoparticles [35,36] provide additional physical properties in host polymers, achieving a variety of functional active micro/nano-devices.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, it is significant in the applications of delicate nanoprototyping in microelectronics, micromechanics, microoptics, and microfluidics [129,193,212,219]. Typically, the major problem that restricts the spatial resolution of a metal micro-nanostructure fabricated via FsLDW is the uncontrollable growth and aggregation of metal nanoparticles during the photonreduction process, as shown in Fig.…”
Section: Energy Beam Machiningmentioning
confidence: 99%