Abstract:The multi-trigger resist (MTR) is a new negative tone molecular resist platform for electron beam lithography, as well as extreme ultraviolet and optical lithography. The performance of xMT resist, the precursor to MTR resist, which shows a good combination of sensitivity, low line edge roughness and high-resolution patterning has previously been reported. [1] In order to overcome limitations induced by acid diffusion, a new mechanism-the multi-trigger concept-has been introduced. The results obtained so far a… Show more
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