Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system

Abstract

We report a flexible and efficient method to pattern two-dimensional (2D) multi-scale structures by digital-mask projective lithography (DMPL) with an alterable projective scaling system. In the developed DMPL system, femtosecond laser was modulated by digital micromirror device (DMD) to generate a designable intensity distribution with digital image information. The projective law of this DMPL system based on the geometric optics theory verified for different projective scaling lens systematically has been studied. With the combination of the customizable DMD elements and alterable projective scaling system, 2D designable patterned microstructures with multi-scale size range from millimeter to hundred nanometer have been achieved by a single exposure. In addition, an engineered Fresnel zone plate (FZP) with numerical aperture (NA) of 0.36 and focal length of 114 μm has been achieved by a single exposure of 1.2 s. The acquisition of the array of FZP lens shows the stability and efficiency of the pattern process. The proposed method could be expected to play an important role in the flexible and efficient fabrication of engineered 2D multi-scale structures.

Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays

“…Digital maskless lithography technology usually involves layer-by-layer slicing and multiple exposure processes, with the feature linewidth of the exposure pattern depending on the size of the micromirror unit. It cannot ensure high precision and large-area exposure requirements [25,26]. As the mainstream technology for fabrication of advanced-node micro/nanostructures, mask-based projection lithography technology offers advantages such as a large exposure area, high precision, and efficiency, making it suitable for high-precision fabrication of microlens arrays [27,28].…”

Wetting of Cell Aggregates on Microdisk Topography Structures Achieved by Maskless Optical Projection Lithography

“…[37,38] It is a powerful tool to fabricate large-area micro-nanostructures with high precision and high efficiency. [39][40][41] In this study, large-area microdisk array structures with well-defined parameters were fabricated by FS-MOPL. Subsequently, cell aggregates were placed on microdisk structures and observed using laser scanning confocal fluorescence microscopy (LSCM).…”

Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography

“…[22][23][24][25][26] The employment of fs laser and high-numerical aperture (NA) objective lens to MOPL could simultaneously realize largearea micro-nano structures with high resolution, high efficiency and high flexibility. [27][28][29][30] The critical dimension is a crucial standard to evaluate fabrication capability. Generally, critical dimension includes indexes of line width and gap width.…”