Abstract:This paper reports on the first demonstration of multi-frequency (176, 222, 307, and 482 MHz) oscillators based on piezoelectric AlN contour-mode MEMS resonators. All the oscillators show phase noise values between -88 and -68 dBc/Hz at 1 kHz offset and phase noise floors as low as -160 dBc/Hz at 1 MHz offset. The same Pierce circuit design is employed to sustain oscillations at the 4 different frequencies, while the oscillator core consumes at most 10 mW. The AlN resonators are currently wirebonded to the in… Show more
“…In contrast, flexural mode Si resonators show a relatively low Q-factor which might be caused by the fact that in a flexural mode resonator, the stress and strain are mostly located at the (lossy) resonator surface. AlN-based bulk mode piezoelectric resonators show a lower Q than bulk mode Si resonators [53,[72][73][74]76] and reported values are well below the theoretical f•Q limit especially for lower frequencies. The lower than expected Q-factor of AlNbased resonators can be explained by losses associated with the metal electrode that is deposited on the AlN needed for driving the resonator [161,162].…”
Section: Q-factormentioning
confidence: 74%
“…The loop gain is defined by the combined transfer of the resonator and the sustaining amplifier. It therefore depends on the amplifier topology being applied [51,53]. The amplifier topology that is most easy to analyze is the transimpedance amplifier (TIA) with buffered output, as is shown in figure 9(a).…”
Section: Oscillation Condition and Oscillation Frequencymentioning
confidence: 99%
“…Often the transducer element and resonator body are identical as is the case in FBAR and BAW resonators where a standing wave is excited inside the piezoelectric film. The piezoelectric material that is used in MEMS resonators is almost exclusively PVD AlN [53,[71][72][73][74][75][76], but sometimes other materials such as ZnO [77] are used as well. An important disadvantage of AlN-based resonators is that the Q-factors that can be obtained are relatively low.…”
MEMS-based oscillators are an emerging class of highly miniaturized, batch manufacturable timing devices that can rival the electrical performance of well-established quartz-based oscillators. In this review, a description is given of the key properties of a MEMS resonator that determine the overall performance of a MEMS oscillator. Piezoelectric, capacitive and active resonator transduction methods are compared and their impact on oscillator noise and power dissipation is explained. An overview is given of the performance of MEMS resonators and MEMS-based oscillators that have been demonstrated to date. Mechanisms that affect the frequency stability of the resonator, such as temperature-induced frequency drift, are explained and an overview is given of methods that have been demonstrated to improve the frequency stability. The aforementioned performance indicators of MEMS-based oscillators are benchmarked against established quartz and CMOS technologies.
“…In contrast, flexural mode Si resonators show a relatively low Q-factor which might be caused by the fact that in a flexural mode resonator, the stress and strain are mostly located at the (lossy) resonator surface. AlN-based bulk mode piezoelectric resonators show a lower Q than bulk mode Si resonators [53,[72][73][74]76] and reported values are well below the theoretical f•Q limit especially for lower frequencies. The lower than expected Q-factor of AlNbased resonators can be explained by losses associated with the metal electrode that is deposited on the AlN needed for driving the resonator [161,162].…”
Section: Q-factormentioning
confidence: 74%
“…The loop gain is defined by the combined transfer of the resonator and the sustaining amplifier. It therefore depends on the amplifier topology being applied [51,53]. The amplifier topology that is most easy to analyze is the transimpedance amplifier (TIA) with buffered output, as is shown in figure 9(a).…”
Section: Oscillation Condition and Oscillation Frequencymentioning
confidence: 99%
“…Often the transducer element and resonator body are identical as is the case in FBAR and BAW resonators where a standing wave is excited inside the piezoelectric film. The piezoelectric material that is used in MEMS resonators is almost exclusively PVD AlN [53,[71][72][73][74][75][76], but sometimes other materials such as ZnO [77] are used as well. An important disadvantage of AlN-based resonators is that the Q-factors that can be obtained are relatively low.…”
MEMS-based oscillators are an emerging class of highly miniaturized, batch manufacturable timing devices that can rival the electrical performance of well-established quartz-based oscillators. In this review, a description is given of the key properties of a MEMS resonator that determine the overall performance of a MEMS oscillator. Piezoelectric, capacitive and active resonator transduction methods are compared and their impact on oscillator noise and power dissipation is explained. An overview is given of the performance of MEMS resonators and MEMS-based oscillators that have been demonstrated to date. Mechanisms that affect the frequency stability of the resonator, such as temperature-induced frequency drift, are explained and an overview is given of methods that have been demonstrated to improve the frequency stability. The aforementioned performance indicators of MEMS-based oscillators are benchmarked against established quartz and CMOS technologies.
“…Furthermore, the switch effectively turns off the resonator by lowering its transmission response by at least 39.5 dB. For example, this switch could effectively turn on and off a bank of different frequency AlN resonators placed in the same used in a Pierce oscillator circuit as was like the one demonstrated in [34].…”
Section: Electrical Characterization Of the Switchmentioning
This work reports on piezoelectric Aluminum Nitride (AlN) based dual-beam RF MEMS switches that have been monolithically integrated with AlN contour-mode resonators. The dual-beam switch design presented in this paper intrinsically compensates for the residual stress in the deposited films, requires low actuation voltage (5 to 20 V), facilitates active pull-off to open the switch and exhibits fast switching times (1 to 2 μs). This work also presents the combined response (cascaded S parameters) of a resonator and a switch that were co-fabricated on the same substrate. The response shows that the resonator can be effectively turned on and off by the switch. A post-CMOS compatible process was used for the co-fabrication of both the switches and the resonators. The single-chip RF solution presented herein constitutes an unprecedented step forward towards the realization of compact, low loss and integrated multi-frequency RF front-ends.Abstract. This work reports on piezoelectric Aluminum Nitride (AlN) based dual-beam RF MEMS switches that have been monolithically integrated with AlN contour-mode resonators.The dual-beam switch design presented in this paper intrinsically compensates for the residual stress in the deposited films, requires low actuation voltage (5 to 20 V), facilitates active pull-off to open the switch and exhibits fast switching times (1 to 2 µs). This work also presents the combined response (cascaded S parameters) of a resonator and a switch that were co-fabricated on the same substrate. The response shows that the resonator can be effectively turned on and off by the switch. A post-CMOS compatible process was used for the co-fabrication of both the switches and the resonators. The single-chip RF solution presented herein constitutes an unprecedented step forward towards the realization of compact, low loss and integrated multi-frequency RF front-ends.
“…This FOM can be seen as a more rigorous way of expressing the same considerations presented in section 1 in regards to energy efficiency and electromechanical coupling in guiding the choice of a transduction mechanism over another. It turns out that the FOM of a resonator ends up directly impacting key device performance in electronic systems such as insertion loss in a filter 41 and power consumption in an oscillator 42 . Another important parameter to take into account in the design of a mechanical resonator and that relates directly to the device geometry (i.e.…”
Section: From Micro To Nanoelectromechanical Resonators: Challenges Amentioning
A major challenge associated with the demonstration of high frequency and fast NanoElectroMechanical Systems (NEMS) components is the ability to efficiently transduce the nanomechanical device. This work presents noteworthy opportunities associated with the scaling of piezoelectric aluminum nitride (AlN) films from the micro to the nano realm and their application to the making of efficient NEMS resonators and switches that can be directly interfaced with conventional electronics. Experimental data showing NEMS AlN resonators (250 nm thick with lateral features as small as 300 nm) vibrating at record-high frequencies approaching 10 GHz with Qs close to 500 are presented. These NEMS resonators could be employed as sensors to tag analyte concentrations that reach the part per trillion levels or for frequency synthesis and filtering in ultra-compact microwave transceivers. 100 nm thick AlN films have been used to fabricate NEMS actuators for mechanical computing applications. Experimental data confirming that bimorph nanopiezo-actuators have the same piezoelectric properties of microscale counterparts and can be adopted for the implementation of mechanical logic elements are presented.
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