2012
DOI: 10.1016/j.jcrysgro.2011.12.013
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Multi feed seed (MFS) high pressure crystallization of 1–2in GaN

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Cited by 32 publications
(11 citation statements)
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“…Similar single longitudinal mode characteristics has also been observed in the spectral output of other AlGaInN laser diodes and was explained by surface roughness inadvertently introduced during growth 4 and that the single mode is stabalised by longitudinal mode competition caused by optical gain saturation 5 . Similarly we observe a surface topology of the order of ~10nm in height and a periodicity of 100nm, eventhough the epitaxy growth is done on very low defectivity (<5x10 4 cm -2 ) GaN substrates with a flatness of <0.1nm 6 , the surface topology features appear inadvertantly in the last epitaxy layer of growth.…”
supporting
confidence: 57%
“…Similar single longitudinal mode characteristics has also been observed in the spectral output of other AlGaInN laser diodes and was explained by surface roughness inadvertently introduced during growth 4 and that the single mode is stabalised by longitudinal mode competition caused by optical gain saturation 5 . Similarly we observe a surface topology of the order of ~10nm in height and a periodicity of 100nm, eventhough the epitaxy growth is done on very low defectivity (<5x10 4 cm -2 ) GaN substrates with a flatness of <0.1nm 6 , the surface topology features appear inadvertantly in the last epitaxy layer of growth.…”
supporting
confidence: 57%
“…Similar single longitudinal mode characteristics has also been observed in the spectral output of other AlGaInN laser diodes and was explained by surface roughness inadvertently introduced during growth 3 and that the single mode is stabalised by longitudinal mode competition caused by optical gain saturation 4 . Similarly we observe a surface topology of the order of ~10nm in height and a periodicity of 100nm 5 , eventhough the epitaxy growth is done on very low defectivity (<5x10 4 cm -2 ) GaN substrates with a flatness of <0.1nm 6 , the surface topology features appear inadvertantly in the last epitaxy layer of growth. The dominant single mode characteristic is observe in all our AlGaInN LD devices at moderate optical powers up to ~25mW.…”
supporting
confidence: 56%
“…Recently, single crystal growth of large area, very low dislocation density and uniform GaN substrates are grown using a combination of high temperature and high pressure has been realised, enabling a range of AlGaInN laser technology to be developed 1,2 . A typical AlGaInN laser diode epitaxy structure grown by MOCVD consists of; i) 0.8 µm Al 0.08 Ga 0.92 N lower cladding layer, ii) 50 nm GaN lower waveguide layer, iii) 50 nm In 0.02 Ga 0.98 N injection layer, iv) In x Ga 1-x N/In 0.02 Ga 0.98 N quantum wells x3 (3.5/9 Å) -the indium composition x (x=0.05-0.2) and well thickness can be varied to change the emission wavelength, v) 20 nm Al 0.2 Ga 0.8 N Electron Blocking Layer, vi) 80 nm GaN waveguide and vii) 350 nm Al 0.08 Ga 0.92 N upper cladding.…”
Section: Resultsmentioning
confidence: 99%