2004
DOI: 10.1016/j.jcrysgro.2003.11.065
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MOVPE growth of Ga 3D structures for fabrication of GaN materials

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Cited by 15 publications
(41 citation statements)
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References 18 publications
(25 reference statements)
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“…The growth preliminary mechanism model can be assimilated to the VLS published one, in which metallic elements are present at the substrate surface to build the rod structure [13][14][15]. The metal-organic molecule interaction with other substrate surfaces seems to be a general and natural behavior to produce 3D structures [11]. These 3D microstructures can eventually be utilized in future micro/nanometer material/devices development, e.g.…”
Section: Resultsmentioning
confidence: 99%
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“…The growth preliminary mechanism model can be assimilated to the VLS published one, in which metallic elements are present at the substrate surface to build the rod structure [13][14][15]. The metal-organic molecule interaction with other substrate surfaces seems to be a general and natural behavior to produce 3D structures [11]. These 3D microstructures can eventually be utilized in future micro/nanometer material/devices development, e.g.…”
Section: Resultsmentioning
confidence: 99%
“…We just used the conventional MOCVD facilities for the growth of semiconducting wire-like materials. The use of MO multiple sources can eventually be used for III-V bandgap engineering and selectively wiring circuit [11,16].…”
Section: Resultsmentioning
confidence: 99%
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“…In order to do so, optical microscopy (OM), scanning electron microscopy (SEM), cathodoluminescence (CL), twophoton excitation (2PH), and fluorescence (FL) techniques are employed in order to characterize these 3D structures. The 3D structure chemical composition and crystallographic analysis have already been previously reported [10,11]. The room temperature (RT) 2PH and FL experimental details are described elsewhere and are performed under optical microscopic conditions [4,[11][12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%