2019
DOI: 10.1016/j.apsusc.2019.01.222
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MoS2 cleaning by acetone and UV-ozone: Geological and synthetic material

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Cited by 10 publications
(9 citation statements)
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“…Moreover, it is difficult to remove the volatile organic solvent from the nanoconfined environment in NS through evaporation at ambient condition. It is known that the adsorbed organic solvents show great influence on the properties and device performance of TMDC nanosheets. Consequently, the performance of the TMDC NS-based device could be further improved by removing the organic solvent from the NS. Therefore, it is necessary to develop an organic solvent-free method to prepare TMDC NS and enhance its performance.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, it is difficult to remove the volatile organic solvent from the nanoconfined environment in NS through evaporation at ambient condition. It is known that the adsorbed organic solvents show great influence on the properties and device performance of TMDC nanosheets. Consequently, the performance of the TMDC NS-based device could be further improved by removing the organic solvent from the NS. Therefore, it is necessary to develop an organic solvent-free method to prepare TMDC NS and enhance its performance.…”
Section: Introductionmentioning
confidence: 99%
“…After carbonization, biomass materials form amorphous carbon, which need to be soaked for a long time to show hydrophilicity. In order to make CGA soak quickly in water, combined with the previous study of the surface superhydrophilic method, benzophenone was used as a photoinitiator and UV-grafting of acrylic acid monomer on the surface of CGA was carried out (Figure h). Compared with CGA, UV-grafting with PAA did not bring noticeable change in the weight, size, or pores of SH-CGA. Both the SEM micrographs of CGA and SH-CGA show an interconnected 3D framework of microporous structure with pore sizes varying from 5 to 50 μm, but there is a layer of coating on the surface of SH-CGA (Figure i).…”
Section: Results and Discussionmentioning
confidence: 99%
“…However, long exposures of MoS 2 to UV-O 3 have also been found to oxidize the Mo, which compromises the MoS 2 [37,54]. In this work, the process developed by Azcatl As shown in Fig.…”
Section: Hzo Atomic Layer Deposition Efficacymentioning
confidence: 88%
“…TiN) [19], doing so would require transfer of the TMDC onto the HZO after the HZO is prepared. It is known that transfer processes introduce contaminants by leaving behind residues that could affect the interface and device properties [33][34][35][36][37]. Thus, in this work, we directly grow HZO on TMDCs through ALD, and show differences in the efficacy of the ALD process depending on the TMDC and its functionalization.…”
Section: Introductionmentioning
confidence: 90%