2016
DOI: 10.1063/1.4971857
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MoS2 based dual input logic AND gate

Abstract: Crystalline monolayers of CVD MoS2 are used as the active semiconducting channel in a split-gate field effect transistor. The device demonstrates logic AND functionality that is controlled by independently addressing each gate terminal with ±10V. When +10V was simultaneously applied to both gates, the device was conductive (ON), while any other combination of gate voltages rendered the device resistive (OFF). The ON/OFF ratio of the device was ∼ 35 and the charge mobility using silicon nitride as the gate diel… Show more

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Cited by 5 publications
(2 citation statements)
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“…conventional mechanical exfoliation, chemical vapor deposition (CVD) and atomic layer deposition (ALD) have been experimentally confirmed with capability in preparing highquality wafer-scale TMD thin films [6][7][8][9][10]. Both methods have been tested in building device arrays and even simple logic circuits [11,12].…”
Section: Introductionmentioning
confidence: 97%
“…conventional mechanical exfoliation, chemical vapor deposition (CVD) and atomic layer deposition (ALD) have been experimentally confirmed with capability in preparing highquality wafer-scale TMD thin films [6][7][8][9][10]. Both methods have been tested in building device arrays and even simple logic circuits [11,12].…”
Section: Introductionmentioning
confidence: 97%
“…Recent studies with direct bandgap multilayer ReS2 (~ 1.4 -1.5 eV) have reported various electronics and optoelectronics applications. [11][12][13][14][15] Different MIS-type device structures have been explored using 2d material based heterostructures 3,[16][17][18][19][20] , as has their device application 21 and logic gate operation 9,[22][23][24] . However, little work has been reported on ReS2 based heterostructure in relation to MIS-type tunnel diodes with a view to using these diodes for logic gate operation and the heterostructure for multifunctional device applications.…”
Section: Introductionmentioning
confidence: 99%