2004
DOI: 10.1016/s0040-6090(03)01906-0
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Morphology control of ferroelectric lead titanate thin films prepared by electrostatic spray deposition

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Cited by 3 publications
(3 citation statements)
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“…Surprisingly, the surface roughness for any given n was less than the volume equivalent diameter of the average deposited agglomerate (agglomerate with n primary particles). Highly uniform films produced by EHDA pyrolysis have been observed previously (Huang et al 2004;Kaelin et al 2004). Presumably, this is due to the random nature of the deposition process, as the probability of a particle depositing in a given area was assumed to be constant during simulations.…”
Section: Droplet Geometric Standard Deviationmentioning
confidence: 91%
“…Surprisingly, the surface roughness for any given n was less than the volume equivalent diameter of the average deposited agglomerate (agglomerate with n primary particles). Highly uniform films produced by EHDA pyrolysis have been observed previously (Huang et al 2004;Kaelin et al 2004). Presumably, this is due to the random nature of the deposition process, as the probability of a particle depositing in a given area was assumed to be constant during simulations.…”
Section: Droplet Geometric Standard Deviationmentioning
confidence: 91%
“…More source materials, including inorganic compounds such as metal nitrates and chlorides, can be used in aerosol deposition techniques, but there are some problems such as complicated thermal treatment, porous structure, and shorting failure of the films. [22,23] In order to extend the range of source materials and use safe and commercially available chemicals as precursors in thin film deposition, a deposition technique similar to CVD, mist plasma evaporation (MPE), has been developed (by us) to deposit TiO 2 , LaNiO 3 , and BaTiO 3 thin films using an aqueous solution of a metal chloride or nitrate as the precursor. [24][25][26] The MPE deposition process is characterized by the injection of liquid reactants into thermal plasma where droplets of the solution are partially or totally evaporated, decomposed, and ionized to their elements.…”
Section: Introductionmentioning
confidence: 99%
“…These include physical vapor deposition such as rf-sputtering [2], and chemical vapor deposition of metalorganic deposition [3], spray pyrolysis [4], and so on. Spray pyrolysis [5] is an economic and convenient process and has been used on the fabrication of inorganic films [6][7]. However, literatures on the fabrication and electrical characteristics of PZT and PLZT thin films by spray pyrolysis are very few [8].…”
mentioning
confidence: 99%