2010
DOI: 10.1016/j.electacta.2010.07.007
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Morphology control of cathodically deposited TiO2 films

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Cited by 21 publications
(27 citation statements)
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“…−1.6 V on curve 1, which was much more negative than the onset potential of NO 3 − reduction obtained in the threeelectrode system. 19,20 This phenomenon is reasonable because of the electrochemical polarization on both anode and cathode. Second, the onset potential of NO 3 − reduction was slightly shifted positively to ca.…”
Section: Resultsmentioning
confidence: 95%
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“…−1.6 V on curve 1, which was much more negative than the onset potential of NO 3 − reduction obtained in the threeelectrode system. 19,20 This phenomenon is reasonable because of the electrochemical polarization on both anode and cathode. Second, the onset potential of NO 3 − reduction was slightly shifted positively to ca.…”
Section: Resultsmentioning
confidence: 95%
“…−1.5 V on curves 2 and 3, indicating that the freshly deposited oxyhydroxyl titanium species are an electrocatalyst for NO 3 − reduction. 19 Third, on curve 1, the sharp increase in the cathodic current at potentials negative to −2.4 V is attributed to hydrogen evolution on the Ti substrate which has not been completely coated with a layer of oxy-hydroxyl titanium species. On the other hand, this reaction has been significantly depressed to occur at potentials more negative than −3.05 V on curves 2 and 3.…”
Section: Resultsmentioning
confidence: 98%
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“…Hence, reduction of NO 3 À is not significantly affected by the metallic precursors and significantly occurs at potentials negative to À0.63 V, leading to the deposition of hydroxides. The precipitation of hydroxides at potentials between À0.63 and 0.9 V is believed to result in the different ieE responses at potentials negative to À0.9 V because different hydroxides and/or oxides might show different catalytic activities for the NO 3 À reduction [13] or hydrogen evolution [14]. Since metallic Ni and Co may be codeposited with their hydroxides in the very negative potential region (e.g., negative than À0.9 V), the current density for depositing Co(OH) 2 and Ni(OH) 2 from the above two baths is fixed at 1 mA cm À2 to avoid the possible deposition of metallic Ni or Co in the hydroxide films.…”
Section: Reduction Of Nomentioning
confidence: 98%
“…15 nm. Moreover, there are several tiny pores randomly distributed on these thin Co(OH) 2 platelets, probably due to N 2 bubbling [13]. In Fig.…”
Section: Reduction Of Nomentioning
confidence: 98%