2018
DOI: 10.1016/j.materresbull.2017.09.005
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MoO x modified ITO/a-Si:H(p) contact for silicon heterojunction solar cell application

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Cited by 23 publications
(14 citation statements)
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“…Moreover, TMOs deposition can be carried out with simple and low-cost processes [15]. In fact, several groups devoted research works on TMOs-based solar cells [16][17][18][19][20][21][22][23][24][25] achieving conversion efficiency values up to 23.5% [26]. Interestingly, TMOs exhibit electronic properties favorable for electron transport as in case of zinc oxide (ZnO) [27] or titanium dioxide (TiO2) [28] and also for hole transport as in case of molybdenum trioxide (MoO3) [29], vanadium pentoxide (V2O5) [30] or tungsten trioxide (WO3) [21].…”
Section: Introductionmentioning
confidence: 99%
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“…Moreover, TMOs deposition can be carried out with simple and low-cost processes [15]. In fact, several groups devoted research works on TMOs-based solar cells [16][17][18][19][20][21][22][23][24][25] achieving conversion efficiency values up to 23.5% [26]. Interestingly, TMOs exhibit electronic properties favorable for electron transport as in case of zinc oxide (ZnO) [27] or titanium dioxide (TiO2) [28] and also for hole transport as in case of molybdenum trioxide (MoO3) [29], vanadium pentoxide (V2O5) [30] or tungsten trioxide (WO3) [21].…”
Section: Introductionmentioning
confidence: 99%
“…Interestingly, TMOs exhibit electronic properties favorable for electron transport as in case of zinc oxide (ZnO) [27] or titanium dioxide (TiO2) [28] and also for hole transport as in case of molybdenum trioxide (MoO3) [29], vanadium pentoxide (V2O5) [30] or tungsten trioxide (WO3) [21]. In particular, amorphous sub-stochiometric MoOx (x ~ 3) is the most common TMO for the hole selective contact [15][16][17][18][19][20]. This material presents good hole selectivity and its large energy gap (around 3 eV) allows optical gain respect to a standard a-Si:H(p) [19].…”
Section: Introductionmentioning
confidence: 99%
“…Although the effect of defect states within the MoO 3 band gap on device performance is generally poorly understood, it is believed that the hole selectivity of MoO 3 is due to defect bands near the CBM. , This likely means that defects that induce electronic states in the band gap nearer to the CBM, such as in Mn Mo × and Zn i × (but not Mn i × ), are of less concern or possibly even beneficial to device performance, whereas states closer to the VBM as produced by V Mo ′ , Cu i × , Mn i × , and Se i · will likely be detrimental because of an enhancement of carrier recombination.…”
Section: Resultsmentioning
confidence: 99%
“…Although the effect of defect states within the MoO 3 band gap on device performance is generally poorly understood, it is believed that the hole selectivity of MoO 3 is due to defect bands near the CBM. 4,54 This likely means that defects that induce electronic states in the band gap nearer to the CBM, such as in Mn Mo × and Zn i × (but not Mn i…”
Section: Resultsmentioning
confidence: 99%
“…Simulation found that a high‐work‐function TCO is necessary at the TCO/p‐a‐Si:H interface for high‐quality passivation of the heterointerface. [ 16 ] An ultrathin MoO x buffer layer was inserted between p‐a‐Si:H and TCO films to gain over 1.5% in FF [ 17 ] . An indium tin oxide (ITO) and indium oxide (In 2 O 3 ) bilayer was applied as front electrode to gain over 1% relatively in FF due to the front contact modification of the thin In 2 O 3 layer.…”
Section: Introductionmentioning
confidence: 99%