2018
DOI: 10.1016/j.nimb.2018.05.046
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Monte Carlo simulations of MgO and Mg(OH) 2 thin films sputtering yields by noble-gas ion bombardment in plasma display panel PDP

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Cited by 14 publications
(9 citation statements)
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“…We have also used the same value of the thickness (10 000 trueÅ) for making a comparison with α‐Al 2 O 3 and TiO 2 ceramic coatings. Then, in our calculations, the input densities of MgO, CaO, SrO, and BaO were 3.4, 3.34, 5.04, and 5.99 g/cm 3 , respectively, the mass of which was 40.3, 56.1, 103.6, and 153.3 amu, respectively, and the input thickness of the films was typically 5000 trueÅ except the MgO having a thickness of 10 000 trueÅ . As an input for E s of these protective layers, we have generally used the heats of sublimation, which were 6.73, 7.16, 6.29, and 4.8 eV, respectively, the same values as listed in Yoshimura et al However, experimental densities for different compounds were unavailable for α‐Al 2 O 3 /XO, TiO 2 /XO, and Al 2 TiO 5 /XO (X = Mg, Ca, Sr, and Ba).…”
Section: Computational Methodologymentioning
confidence: 99%
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“…We have also used the same value of the thickness (10 000 trueÅ) for making a comparison with α‐Al 2 O 3 and TiO 2 ceramic coatings. Then, in our calculations, the input densities of MgO, CaO, SrO, and BaO were 3.4, 3.34, 5.04, and 5.99 g/cm 3 , respectively, the mass of which was 40.3, 56.1, 103.6, and 153.3 amu, respectively, and the input thickness of the films was typically 5000 trueÅ except the MgO having a thickness of 10 000 trueÅ . As an input for E s of these protective layers, we have generally used the heats of sublimation, which were 6.73, 7.16, 6.29, and 4.8 eV, respectively, the same values as listed in Yoshimura et al However, experimental densities for different compounds were unavailable for α‐Al 2 O 3 /XO, TiO 2 /XO, and Al 2 TiO 5 /XO (X = Mg, Ca, Sr, and Ba).…”
Section: Computational Methodologymentioning
confidence: 99%
“…This process is of considerable importance to plasma‐matter interactions because it is one of the major factors responsible for plasma contamination in display panels. The usual parameter used to characterize this particular case of radiation damage is the erosion or sputtering yield, measured as the ratio of target atoms expelled per incoming particle . It is known that the sputtering yield is highly sensitive to the surface binding energy Es of the material.…”
Section: Introductionmentioning
confidence: 99%
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“…10,23 It is quantified by the sputtering yield, that is, the mean number of atoms removed per incident particle depends on the ion incident angle, the ion incident energy, the mass of the ion and target atoms, the surface binding energy, but it is dependent of the charge. 24 As a result, both the incident particles and the energetic recoil atoms can be scattered back toward the surface. If their kinetic energies are high enough to overcome the surface potential barrier, they can leave the surface and influx to the fusion plasma.…”
mentioning
confidence: 99%
“…If their kinetic energies are high enough to overcome the surface potential barrier, they can leave the surface and influx to the fusion plasma. [23][24][25][26][27][28][29][30][31][32][33] Here, we aim to study the behavior of the sputtering yields, number of vacancies and backscattering yields of six candidate plasma face components (PFC) materials; pure tungsten (W), binary alloys (W-Cr, W-Si), and ternary alloys (W-Cr-Si, W-Cr-Ti, W-Cr-Y) as a function of the beam primary ion energy and incidence angle by He þ ion bombardment by using Monte Carlo SRIM-2013 program. The result are particularly important for estimating the lifetime of plasma face component (PFC) and analysing the extent of impurity contamination, especially with a high plasma current fusion reactor.…”
mentioning
confidence: 99%