Monte Carlo simulation of ions in a magnetron plasma

Goeckner, Matthew; Goree, J.; Sheridan, T. E.

doi:10.1109/27.106828

Cited by 87 publications

(44 citation statements)

References 13 publications

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“…3,4 A distinctive feature of magnetron sputtering system is the presence of an annular magnetic field on the cathode (so-called the racetrack zone) which confines electrons and enhances the ionization rate by enforcing the E ϫ B drift motion on electrons near the cathode. Since the motions of charged particles near the cathode is complicated by the complex configurations of magnetic and electric fields, many efforts have been made to accurately understand the discharge phenomena near the cathode through experimental [5][6][7][8][9][10][11][12] and theoretical works. [13][14][15][16][17][18][19] In theoretical works, two approaches of fluid model [13][14][15] and particle-in-cell/Monte Carlo method [16][17][18][19] have performed but, the PIC/MC simulations have been preferably done in spite of heavy computational load because of the inadequacy of the fluid model in lowpressure discharges of few mTorr and then, have provided a lot of information.…”

Section: Introductionmentioning

confidence: 99%

Electron transport in the downstream region of planar unbalanced magnetron discharge

Seo

Chang

2004

Journal of Applied Physics

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In this study, we will investigate the electron transport in the downstream region of a planar and unbalanced (type II) magnetron discharge. The effects of the anode sheath boundary and diverging magnetic field on the electron kinetics such as the electron loss mechanism at plasma-sheath boundary and the electron distribution function will be examined through the probe measurements. The spatially resolved probe measurements reveal the existence of an electron drift from the cathode fall region to the downstream region. It is found that this drift is caused by the axial gradient of magnetic field (the magnetic mirror force) and then derives an electron current to the grounded substrate on which the potential of the sheath is very low; so the current balance between the cathode and anode currents is kept. The experimental results show that the electron transport in the downstream region is not governed by the classical diffusion (mobility and diffusion dominated) but is dominated by the modified diffusion including the electron drift caused by the magnetic mirror force. Additionally, the mechanism and the experimental evidence on the presence of a non-Maxwellian electron energy distribution function (in particular, bi-Maxwellian distribution) in magnetron discharge will be presented showing that the non-Maxwellian electron energy distribution function is due to the combined effects of the electron drift toward the substrate and the sheath boundary condition.

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Section: Introductionmentioning

confidence: 99%

Electron transport in the downstream region of planar unbalanced magnetron discharge

Seo

Chang

2004

Journal of Applied Physics

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“…9.11, while in reality it is essential the electric field strength in the region of the magnetic trap. Hence, a nonuniform electric field distribution in a space is used usually [408][409][410][411]. Nevertheless, we will use a uniform electric field, as it is given in Fig.…”

Section: Fig 912mentioning

confidence: 99%

Theory of Gas Discharge Plasma

Smirnov

2015

Springer Series on Atomic, Optical, and Plasma Physics

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The Springer Series on Atomic, Optical, and Plasma Physics covers in a comprehensive manner theory and experiment in the entire field of atoms and molecules and their interaction with electromagnetic radiation. Books in the series provide a rich source of new ideas and techniques with wide applications in fields such as chemistry, materials science, astrophysics, surface science, plasma technology, advanced optics, aeronomy, and engineering. Laser physics is a particular connecting theme that has provided much of the continuing impetus for new developments in the field, such as quantum computation and Bose-Einstein condensation. The purpose of the series is to cover the gap between standard undergraduate textbooks and the research literature with emphasis on the fundamental ideas, methods, techniques, and results in the field.More information about this series at

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“…This in order to minimize the error due to extrapolation. Furthermore, the assumption was made that the mean ion energy is 80% of the discharge voltage [20,22,23]. The calculated correction factors for each material and target type can be found in table 1.…”

Section: U N C O R R E C T E D P R O O Fmentioning

confidence: 99%

The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

et al. 2013

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Abstract. The effect of the target surface morphology on the sputter deposition flux and the energy flux is investigated by comparing solid targets to pressed powder targets. A significant, material dependent difference of the effective sputter yield between both target types is noticed. This difference is explained by combining two effects: a local increase of the elemental sputter yield and the redeposition of sputtered atoms onto the target. Both effects strongly depend on the target surface morphology. The experimental trends are reproduced by Monte Carlo simulations. This allows a description of the angular distribution of the sputtered atoms which is an important parameter to define the particle flux and the energy distribution of the atoms arriving on the substrate. Using the previously developed particle trajectory code simtra, the latter is demonstrated for the studied materials (Al, Ag, Cu, and Ti).

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Monte Carlo simulation of ions in a magnetron plasma

Cited by 87 publications

References 13 publications

Electron transport in the downstream region of planar unbalanced magnetron discharge

Electron transport in the downstream region of planar unbalanced magnetron discharge

Theory of Gas Discharge Plasma

The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

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