ESSDERC 2019 - 49th European Solid-State Device Research Conference (ESSDERC) 2019
DOI: 10.1109/essderc.2019.8901817
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Monolithically integrated GaN power ICs designed using the MIT virtual source GaNFET (MVSG) compact model for enhancement-mode p-GaN gate power HEMTs, logic transistors and resistors

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Cited by 3 publications
(4 citation statements)
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“…For a better visualization, we depicted the initial 8 µs waveform in figure 6(a). In this simulation, the gate leakage was model as in [23]. It is shown that, within each pulse of switching, V G decreases with respect to time, and then stabilizes at the value in quasi-static mode, indicating a voltage distribution process of the V G from capacitance-dependence to resistance-dependence by the gate current of the LS HEMT, same as in the measurement.…”
Section: Gate Voltage Redistributionmentioning
confidence: 80%
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“…For a better visualization, we depicted the initial 8 µs waveform in figure 6(a). In this simulation, the gate leakage was model as in [23]. It is shown that, within each pulse of switching, V G decreases with respect to time, and then stabilizes at the value in quasi-static mode, indicating a voltage distribution process of the V G from capacitance-dependence to resistance-dependence by the gate current of the LS HEMT, same as in the measurement.…”
Section: Gate Voltage Redistributionmentioning
confidence: 80%
“…At V GS > 0 V the gate leakage is dominated by the Schottky metal/p-GaN junction, whereas at V GS < 0 V the gate leakage is perimeter dependent. Both branches can be modeled using the Pool-Frenkel tunneling equation, as described in [23]. The V T instability of GaN HEMTs is a significant nonideality that impacts the GaN circuit-level performance.…”
Section: Adapted Mvsg Modelmentioning
confidence: 99%
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“…These hypotheses were verified by simulating the extraction of the equivalent circuit for the external loop. In the simulation, MVSG-HV (MIT Virtual Source GaNFET-High Voltage) compact model [25,26,27,28,29] was used as the GaN-HEMT model [30]. The parameters in MVSG-HV were calibrated based on experimental characterization results of discrete GaN-HEMTs fabricated by Interuniversity Microelectronics Centre, Belgium (Table III).…”
Section: Measurement Setupsmentioning
confidence: 99%