2019
DOI: 10.1021/acsami.9b17076
|View full text |Cite
|
Sign up to set email alerts
|

Monolithic Solder-On Nanoporous Si-Cu Contacts for Stretchable Silicone Composite Sensors

Abstract: We report a method of creating solderable, mechanically robust, electrical contacts to interface (soft) silicone-based strain sensors with conventional (hard) solid-state electronics using a nanoporous Si-Cu composite. The Si-based solder-on electrical contact consists of a copper-plated nanoporous Si top surface formed through metal-assisted chemical etching and electroplating and a smooth Si bottom surface that can be covalently bonded onto silicone-based strain sensors through plasma bonding. We investigate… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
7
0

Year Published

2020
2020
2022
2022

Publication Types

Select...
5
1

Relationship

6
0

Authors

Journals

citations
Cited by 8 publications
(7 citation statements)
references
References 61 publications
0
7
0
Order By: Relevance
“…For example, strain sensors with either high gauge factor (GF) (up to 1000-16 000) and low strain at break (2-7%) 19,20 or, vice versa, with a wide range of working strain (up to 280-300%) but low GF (0.06-13.1), have been reported. [21][22][23] Recently, this challenge has been partially addressed by incorporating auxetic mechanical metamaterials (GF B 800 and strain-at-break of 160%), 24 or by patterning silver nanowires on polydimethylsiloxane films (GF B 150 000 and strain-at-break of 60%). 25 Beyond the sensitivity/deformation dichotomy, the need for (typically rigid) energy storage devices is another critical constraint limiting the practical use of flexible and highly deformable sensors.…”
mentioning
confidence: 99%
“…For example, strain sensors with either high gauge factor (GF) (up to 1000-16 000) and low strain at break (2-7%) 19,20 or, vice versa, with a wide range of working strain (up to 280-300%) but low GF (0.06-13.1), have been reported. [21][22][23] Recently, this challenge has been partially addressed by incorporating auxetic mechanical metamaterials (GF B 800 and strain-at-break of 160%), 24 or by patterning silver nanowires on polydimethylsiloxane films (GF B 150 000 and strain-at-break of 60%). 25 Beyond the sensitivity/deformation dichotomy, the need for (typically rigid) energy storage devices is another critical constraint limiting the practical use of flexible and highly deformable sensors.…”
mentioning
confidence: 99%
“…2b, c ). Without this step, the metal films electroplated do not adhere to the surface of the substrate 24 . The pSi layer also allows thermal bonding of sheets of polymer films in an ordinary heat press after patterning through laser-cutting (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…First, each wafer is plated electrolessly for 20 s (in 80 µM KAuCl 4 and 0.5% HF) to form a thin layer of gold particulate film. The wafer is then placed inside an etching bath containing an aqueous solution of H 2 O 2 and HF with a ratio of 1:20 v/v (30% H 2 O 2 : 10% HF) to perform metal-assisted chemical etching (MACE) of Si for 10 min [22][23][24] . This process forms a 500 nm thick nanoporous Silicon (pSi) layer on each side of the wafer (Fig.…”
Section: Fabrication Of Trisilix Chipsmentioning
confidence: 99%
“…[41][42][43][44][45][46] Furthermore, the electrical resistance of the embroidered patterns can be reduced by denser stitching, using a longer stich length or deposition of additional materials by electroplating. [43,[47][48][49] (ii) In comparison to metalcoated conductive threads, the electrical resistance of PECOTEX were a few orders magnitude higher; however, the electrical resistance of the metallic threads increased and became comparable to the PECOTEX after embroidery. (iii) Although we did not study in detail, we did notice a drop in electrical conductivity of the patterns embroidered with PECOTEX over time.…”
Section: Discussionmentioning
confidence: 99%