2016
DOI: 10.1021/acsphotonics.6b00269
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Monolithic Broadband InGaN Light-Emitting Diode

Abstract: A monolithic non-phosphor broadband-emission light-emitting diode is demonstrated, comprising a combination of high-density micro-structured and nano-structured InGaN-GaN quantum wells fabricated using a top-down approach. Broadband emission is achieved by taking advantage of low-dimensional-induced strain-relaxation of highly-strained quantum wells, combining light emitted from strain-relaxed nano-tips at wavelengths shorter than the as-grown by as much as 80 nm with longer-wavelength light emitted from the l… Show more

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Cited by 20 publications
(19 citation statements)
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References 33 publications
(43 reference statements)
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“…[22][23][24][25][26][27][28][29][30][31] There is also an increase in the internal quantum efficiency (IQE), as the electron-hole wavefunction overlap increases. [32] Moreover, as the size of nanostructures decreases, a larger portion of the nanostructures falls within the region 10 nm from the edge, where the strain relaxation (especially in the quantum wells) is strongest, [31] hence, the degree of strain relaxation in the nanostructure increases giving rise to greater spectral blue shift. [24,31,33] Based on the observation that the spectral blue shift is due to the size-dependent strain relaxation in the quantum wells, [22,[24][25][26][27][28][29][30] it was proposed that nanostructures patterned by nanosphere lithography or other techniques could be used to achieve monolithic multicolor emission.…”
Section: Top-down Fabricationmentioning
confidence: 99%
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“…[22][23][24][25][26][27][28][29][30][31] There is also an increase in the internal quantum efficiency (IQE), as the electron-hole wavefunction overlap increases. [32] Moreover, as the size of nanostructures decreases, a larger portion of the nanostructures falls within the region 10 nm from the edge, where the strain relaxation (especially in the quantum wells) is strongest, [31] hence, the degree of strain relaxation in the nanostructure increases giving rise to greater spectral blue shift. [24,31,33] Based on the observation that the spectral blue shift is due to the size-dependent strain relaxation in the quantum wells, [22,[24][25][26][27][28][29][30] it was proposed that nanostructures patterned by nanosphere lithography or other techniques could be used to achieve monolithic multicolor emission.…”
Section: Top-down Fabricationmentioning
confidence: 99%
“…A blue-shift range of 61 nm was demonstrated in the smallest nanopillars with a diameter of 100 nm. [32] Using the same strategy, nanostructures with diameters of 800, 100, and 50 nm were patterned by electron-beam lithography on a wafer with 650 nm emission and integrated together to form monolithic red, green, and blue color-tunable LEDs [36][37][38] as shown in Figure 2a. Monolithic RGB emission was demonstrated by connecting the nanostructured RGB channels with metal interconnects as illustrated in Figure 3a.…”
Section: Top-down Fabricationmentioning
confidence: 99%
“…Recent studies have achieved different emission wavelengths from three-dimensional structures fabricated by local strain engineering [18][19][20]. Using the top-down etching method, the authors of reference [21] fabricated monolithic LEDs combining microstructure and nanostructures of GaInN/GaN, which emit distinctive blue-green-yellow light with a color rendering index (CRI) of 41. However, the fabrication process (even when performed by surface passivation or thermal annealing) can also severely damage the surface and significantly decrease the emission efficiency [22].…”
Section: Introductionmentioning
confidence: 99%
“…Other types of devices are fabricated by the top‐down approach, where a homogeneous QW structure is first grown on typical substrate and then patterned. A broadband monolithic LED obtained by this technique was recently demonstrated by Feng and coworkers . In their work, the broadband emission is obtained in QW structures partially shaped after growth by the means of nano‐ and micromasking (different grades of silica particles dispersion) and ion etching.…”
Section: Introductionmentioning
confidence: 99%
“…First, a typical substrate is covered with a mask with narrow, stripe-shaped windows. Next, GaN is grown in these windows and, depending on the growth conditions and the window direction, GaN microprisms with different crystallographic facets are obtained, for example (11)(12)(13)(14)(15)(16)(17)(18)(19)(20)(21)(22), (11)(12)(13)(14)(15)(16)(17)(18)(19)(20), (1-101), (1-100), (0001). Finally, a LED structure is grown on the microprisms and in each microfacet different emission wavelength is obtained [8][9][10][11][12][13][14][15].…”
mentioning
confidence: 99%