2019
DOI: 10.1002/adma.201970340
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Monolayer Semiconductors: Scanning Probe Lithography Patterning of Monolayer Semiconductors and Application in Quantifying Edge Recombination (Adv. Mater. 48/2019)

Abstract: We appreciate the reviewers for their time and insightful questions. Please find the responses to their comments below.

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Cited by 2 publications
(3 citation statements)
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“…[ 87–92 ] It is can encapsulate diverse cargos, such as small‐molecule drugs, biomolecules, genes, and nanoparticles, in submicron‐/nanofibers through the use of appropriate electrospinning techniques, such as blend electrospinning, emulsion electrospinning, and coaxial electrospinning, and a suitable device. [ 93–101 ] Due to advantages in forming biomimetic nanofibrous structures and providing micro‐/nanoencapsulation, electrospinning is regarded as an excellent method for fabricating cell fibers, particularly those with smaller diameters (<50 µm), as compared to other spinning methods.…”
Section: Technologies For Fabricating Cell Fibersmentioning
confidence: 99%
“…[ 87–92 ] It is can encapsulate diverse cargos, such as small‐molecule drugs, biomolecules, genes, and nanoparticles, in submicron‐/nanofibers through the use of appropriate electrospinning techniques, such as blend electrospinning, emulsion electrospinning, and coaxial electrospinning, and a suitable device. [ 93–101 ] Due to advantages in forming biomimetic nanofibrous structures and providing micro‐/nanoencapsulation, electrospinning is regarded as an excellent method for fabricating cell fibers, particularly those with smaller diameters (<50 µm), as compared to other spinning methods.…”
Section: Technologies For Fabricating Cell Fibersmentioning
confidence: 99%
“…[ 1,2 ] Conventional lithographic technologies like extreme ultraviolet lithography and e‐beam lithography offer high resolution but are mainly suitable for high‐end applications due to their high cost and time‐consuming processes for mass production. This limitation has catalyzed the development of alternative methods, including nanoimprint lithography, [ 3,4 ] laser direct writing, [ 5–8 ] nanotransfer printing, [ 2,9,10 ] PEEL (photolithography, etching, electron beam deposition, and lift‐off) methods, [ 11,12 ] and tip‐based lithography [ 13–21 ] However, the fabrication of sub‐100‐nm‐scale nanostructures at room temperature under ambient conditions remains challenging.…”
Section: Introductionmentioning
confidence: 99%
“…[ 13 ] Various tip‐based lithographies have demonstrated 100 nm‐scale nanopatterning with multiple materials, including metals, [ 13,15,16,17,22,23 ] halide perovskite, [ 24 ] poly(methyl methacrylate) (PMMA), [ 19,25 ] two dimensional (2D) semiconductors. [ 20,26 ] Notably, resist materials used in e‐beam and photolithography have been patterned through tip‐based lithography, [ 15,19,22,25,27–30 ] some achieving sub‐100 nm resolution [ 15,19 ] compatible with nanoimprinting. [ 31 ] Metal nanostructures fabricated via this method find applications in plasmonic nanoparticles (NPs), [ 15,22 ] metal‐assisted chemical etching (MACE) catalysts, [ 13 ] electronic donors and acceptors in transition metal dichalcogenides, [ 16 ] strain sources for single photon emitters (SPEs), [ 21 ] and surface‐enhanced Raman scattering (SERS) templates.…”
Section: Introductionmentioning
confidence: 99%