Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V₃D₃) and azasilane

Abstract

<p>Two consecutive vapor-to-solid ring opening reactions were applied for thin film siloxane polymerization by molecular layer deposition (MLD).</p>

About the importance of purge time in molecular layer deposition of alucone films

“…It can also be seen that the partial pressure of TMA has a much stronger impact on Γ CVD Table 2 Variation of the analytical model parameters with TMA partial pressure extracted by fitting each of the curves in Fig. 4 with eqn (12). The errors given are the standard errors generated by the software used to perform the fitting (OriginPro 2018) Similarly, in order to see the effect of the partial pressure of EG on Γ CVD , we have plotted the variation of observed Γ CVD with the EG partial pressure in Fig.…”

“…6 shows that Γ Total decreases with increasing TMA purge time at all temperatures. By fitting each of these curves with eqn (12) of the model, we have extracted the values of Γ MLD , Γ 0 and the time constant τ p at each temperature as shown in Table 3. The fitting results are shown in the ESI's section B.…”

“…By using organic monomers as precursors, MLD has been used to deposit polymer films such as polyamides, 8 polyimides, 9 polyurea, 10 and others. 11 Recently, the field of MLD has received renewed interest as evident by the exploration of new MLD chemistries, like for example, in the form of ring opening mechanisms 12,13 and click reactions. 14 Further, hybrid organic-inorganic films can also be prepared using common metal-organic precursors and bifunctional organic co-reactants such as alcohols, 13,15,16 phenols, 17 amines 18 and acids.…”

“…Variation of the analytical model parameters with deposition temperature. The values have been extracted by fitting each of the curves in Fig.6with eqn(12) …”

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

“…Along with this recent interest, the MLD material library has been expanded from the polyimides [15,[17][18][19][20][21][22] and polyamides [23][24][25][26][27][28] to many other polymers. [29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44] Both the parent techniques, ALD and MLD, are based on chemical surface reactions between two different gaseous (or vaporized) precursors sequentially pulsed into a vacuum reactor. The combined ALD/MLD technique for the hybrid metal-organic thin films involves a metal precursor similar to those used in ALD and an organic precursor that matches with the metal precursor (Figure 1).…”