1994
DOI: 10.1021/cm00045a004
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Molecular Design and Synthesis of 3-Oxocyclohexyl Methacrylate for ArF and KrF Excimer Laser Resist

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Cited by 36 publications
(26 citation statements)
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“…However, as the exposure wavelength becomes shorter, it appears to be difficult to balance the dry etch resistance with the transparency which is required for effective exposure. Strategies having been proposed to address such a problem include the incorporation of alicyclic moieties into acrylic-based polymer matrix [4][5][6][7][8][9][10][11] ; exploitation of cyclo-olefin based polymer materials [12][13][14][15]. Alternatively, we have proposed [ 16] that the dry etch resistance can be imparted to the matrix after the exposure is completed (Scheme 1).…”
Section: Introductionmentioning
confidence: 99%
“…However, as the exposure wavelength becomes shorter, it appears to be difficult to balance the dry etch resistance with the transparency which is required for effective exposure. Strategies having been proposed to address such a problem include the incorporation of alicyclic moieties into acrylic-based polymer matrix [4][5][6][7][8][9][10][11] ; exploitation of cyclo-olefin based polymer materials [12][13][14][15]. Alternatively, we have proposed [ 16] that the dry etch resistance can be imparted to the matrix after the exposure is completed (Scheme 1).…”
Section: Introductionmentioning
confidence: 99%
“…In spite of the limitation in the matrix polymers for such short-wavelength light, transparent and etch-resistant materials have been reported in a few brief years by workers at Fujitsu [5][6][7][8][9], Matsushita [10], IBM/MIT team [1 1 ], NEC [12], and Toshiba [13]. Much efforts have been focused on methacrylate polymers with alicyclic pendant groups to demonstrate sub-0.2-µm resolution to date.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, design and synthesis of chemically amplified resists for 193-nm lithography has been studied actively. We have developed single-layer resist materials for 193-nm lithography to meet the abovementioned requirements [1][2][3][4][5]. The use of alicyclic methacrylate polymers, such as adamantyl methacrylate, is the principal concept for transparency with etch resistance.…”
Section: Introductionmentioning
confidence: 99%
“…The acid cleavage of the adamantyl group would promote the solubility in the exposed regions. The pyranyl (mevalonic lactone) substituent has a cyclic ~i-hydroxy ketone structure, which is suitable for chemical amplification [4]. Furthermore, it is so hydrophilic that it can cancel out the strong hydrophobicity of the adamantyl protective group.…”
mentioning
confidence: 99%