Cyclization Reaction in Acrylonitrile-Contained Acrylic Copolymers and Its Possible Application for the Improvement of Dry Etch Resistance for Photoresists.
Abstract:Acrylonitrile (AN)/methacrylic acid (MAA) copolymer and AN/tert-butyl methacrylate (tBMA)/MAA terpolymer were prepared, and their dry etch resistance were measured The excellent dry etch resistance found in these materials were attributed to the contribution of some induced chemical reactions. To further understand their roles in the improvement of dry etch resistance, the reactions especially the thermally induced cyclization reaction were investigated in detail. It was found that thermally induced cyclizatio… Show more
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