2014
Molecular beam epitaxy and properties of GaAsBi/GaAs quantum wells grown by molecular beam epitaxy: effect of thermal annealing
Abstract: We have grown GaAsBi quantum wells by molecular beam epitaxy. We have studied the properties of a 7% Bi GaAsBi quantum well and their variation with thermal annealing. High-resolution X-ray diffraction, secondary ion mass spectrometry, and transmission electron microscopy have been employed to get some insight into its structural properties. Stationary and time-resolved photoluminescence shows that the quantum well emission, peaking at 1.23 μm at room temperature, can be improved by a rapid annealing at 650°C,…
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Cited by 27 publications
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“…Based on those results, we assumed a thin layer of GaBiAs with ∼1.2% Bi concentration at the interface and made a rough calculation which corresponds to 1.31 eV-i.e. the capping side of the QW Bi concentration is not abrupt [8]. The line-width of the PR spectra tends to broaden when Bi concentration is increased, due to an increased number of localized states, as expected in highly mismatched alloys (HMAs).…”
Section: Results
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confidence: 71%