Modulating Surface Roughness of Low Temperature PECVD Germanium using Multilayer Drop Casting of 2.85 nm Silicon Nanoparticles

Facile preparation of a water-based antireflective SiO2 film with high transmittance for perovskite solar cells

“…2e and f), resulting in surface scattering. 24 Evidence 25,26 can be found that the growth of the pore size with increasing pH is associated with the size of SiO 2 particles in the films. As the pH increases, the repulsion between silica particles in the sol increases and weakens the condensation reaction between them, thereby inhibiting the growth of silica particles.…”

Strong Reduction in Ge Film Reflectivity by an Overlayer of 3 nm Si Nanoparticles: Implications for Photovoltaics

“…Both bulk crystalline silicon (c-Si) and PECVD Ge/c-Si stacks are diced into 3 × 3 cm 2 pieces, followed by the dispersion of the silicon nanoparticles (Si-NPs) on substrates using a multilayer drop casting method. The detailed method is presented in . Incremental casting is done by dispersing step by step with 100 μL of colloid in each.…”

“…Inset shows the Si NPs solution can be seen to be dominated by bright red-orange luminescence under 365 nm irradiation and the self-assembly on a surface of same size (emitting same band) nanoparticles. (b) Graphic depecting the step by step casting method of Si-NPs on PECVD grown Ge thin film …”

“…The detailed method is presented in. 55 Incremental casting is done by dispersing step by step with 100 μL of colloid in each. Samples are coated with 100, 200, 300, 400, and 500 μL of the Si-NPs cumulative dispersion volume.…”