Vapor–liquid–solid (VLS) growth of nanoscale
or subwavelength
scale semiconductor wires (nanowires) has been proven to be an important
and effective approach to producing high-quality, substrate insensitive
photonic materials with a flexible and ever-expanding coverage of
wavelengths for lasing and other photonic applications. However, the
materials and lasing demonstrations have so far been limited to mostly
ultraviolet to visible wavelengths, with a few exceptions in the short-wavelength
infrared range. A further extension to longer wavelengths (such as
mid-infrared, MIR) using narrower band gap semiconductors encounters
severe challenges: the ever decreasing radiative efficiency due to
the Auger and other nonradiative channels with wavelengths demands
extremely high material quality and significantly narrows the material
choices. This situation is very unsatisfactory, given many important
applications that demand materials and lasers of subwavelength scales
for MIR wavelengths in an integrated platform, especially on silicon.
Here we report our results on lasing demonstration in MIR (3–4
μm) based on a unique combination of high-quality material growth
on a silicon substrate and the choice of an intrinsically strong MIR
material in lead sulfide (PbS). Lasing is demonstrated from single
wires both on the original silicon substrate and on the sapphire substrates
after transferring, with sizes of lasing wires down to below half
of the normalized volume (volume of wires divided by the wavelength
cubed) and operating temperature up to 180 K. Such subwavelength wire
lasers could be important for a wide range of MIR applications on
silicon-based integrated photonic platforms, such as chemical and
environmental sensing, free-space communications, and many others.