Abstract:The curing characteristics of a photocurable resin are critical factors that often decide the
ultimate resolution and structural sharpness of a final product fabricated by microstereolithography
(μ-STL). In this study, we investigated the curing characteristics of the FA1260T photopolymer
under a visible laser light of 442nm wavelength. Modification of the curing property of the
FA1260T is attempted to reduce the cure depth (Dc) by adding a radical quencher to the resin. Also,
an organic solvent was used to re… Show more
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